Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 2/20 | 0.44 |
| ▸ | CYP4A11 | Q02928 | 2/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | PKM | P14618 | 3/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | MGAM | O43451 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | SI | P14410 | 1/20 | 0.36 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.36 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.34 |
| ▸ | PIN1 | Q13526 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16150101 | 0.92 | CYP4F2 (0.50) | CYP4F2CYP4A11ALDH1A1PKMKDM4E | |
| SCHEMBL10023943 | 0.92 | CYP4F2 (0.50) | CYP4F2CYP4A11ALDH1A1PKMKDM4E | |
| SCHEMBL23132525 | 0.87 | CYP4F2 (0.42) | CYP4F2CYP4A11ALDH1A1PKMKDM4E | |
| SCHEMBL6910898 | 0.87 | CYP4F2 (0.39) | CYP4F2CYP4A11ALDH1A1PKMKDM4E | |
| SCHEMBL10136665 | 0.85 | CYP4F2 (0.38) | CYP4F2CYP4A11ALDH1A1PKMKDM4E | |
| SCHEMBL15070911 | 0.84 | CYP4F2 (0.47) | CYP4F2CYP4A11ALDH1A1PKMKDM4E | |
| SCHEMBL12963166 | 0.84 | CYP4F2 (0.37) | CYP4F2CYP4A11ALDH1A1PKMKDM4E | |
| SCHEMBL283884 | 0.83 | MEN1 (0.46) | CYP4F2CYP4A11ALDH1A1PKMKDM4E | |
| SCHEMBL5819364 | 0.83 | ALDH1A1 (0.39) | CYP4F2CYP4A11ALDH1A1PKMKDM4E | |
| SCHEMBL17206359 | 0.83 | ALDH1A1 (0.39) | CYP4F2CYP4A11ALDH1A1PKMKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230399471-A1 | METHOD FOR PRODUCING FLUORINE-CONTAINING COMPOUND AND METHOD FOR PRODUCING SURFACE TREATMENT AGENT | AGC Inc. (JP) | 2023-12-14 | — | — | US | disclosed |
| US-20230399471-A1 | METHOD FOR PRODUCING FLUORINE-CONTAINING COMPOUND AND METHOD FOR PRODUCING SURFACE TREATMENT AGENT | AGC Inc. (JP) | 2023-12-14 | — | — | US | disclosed |
| US-20230399293-A1 | METHOD FOR PRODUCING FLUORINE-CONTAINING COMPOUND AND FLUORINE-CONTAINING COMPOUND | AGC Inc. (JP) | 2023-12-14 | — | — | US | disclosed |
| US-20230399293-A1 | METHOD FOR PRODUCING FLUORINE-CONTAINING COMPOUND AND FLUORINE-CONTAINING COMPOUND | AGC Inc. (JP) | 2023-12-14 | — | — | US | disclosed |
| US-20230220236-A1 | COMPOSITION, SUBSTRATE WITH SURFACE LAYER, METHOD FOR PRODUCING SUBSTRATE WITH SURFACE LAYER, COMPOUNDS, AND METHODS FOR PRODUCING COMPOUNDS | AGC Inc. (JP) | 2023-07-13 | — | — | US | disclosed |
| US-20230220236-A1 | COMPOSITION, SUBSTRATE WITH SURFACE LAYER, METHOD FOR PRODUCING SUBSTRATE WITH SURFACE LAYER, COMPOUNDS, AND METHODS FOR PRODUCING COMPOUNDS | AGC Inc. (JP) | 2023-07-13 | — | — | US | disclosed |
| US-20230120739-A1 | FLUORINE-CONTAINING ETHER COMPOUND AND METHOD OF MANUFACTURING THE SAME, COMPOUND AND METHOD OF MANUFACTURING THE SAME, FLUORINE-CONTAINING ETHER COMPOSITION, COATING LIQUID, AND ARTICLE AND METHOD OF MANUFACTURING THE SAME | AGC Inc. (JP) | 2023-04-20 | — | — | US | disclosed |
| US-20230024292-A1 | FLUORINE-CONTAINING ETHER COMPOUND AND PRODUCTION METHOD THEREFOR, COMPOUND AND PRODUCTION METHOD THEREFOR, FLUORINE-CONTAINING ETHER COMPOSITION, COATING LIQUID, AND ARTICLE AND PRODUCTION METHOD THEREFOR | AGC Inc. (JP) | 2023-01-26 | — | — | US | disclosed |
| WO-2022186271-A1 | METHOD FOR PRODUCING FLUORINE COMPOUND AND METHOD FOR PRODUCING SURFACE TREATMENT AGENT | ＡＧＣ株式会社 | 2022-09-09 | — | — | WO | disclosed |
| US-20220213345-A1 | FLUORINE-CONTAINING ETHER COMPOUND, SURFACE TREATMENT AGENT, FLUORINE-CONTAINING ETHER COMPOSITION, COATING LIQUID, ARTICLE, AND COMPOUND | AGC Inc. (JP) | 2022-07-07 | — | — | US | disclosed |
| US-20220204444-A1 | METHOD OF MANUFACTURING FLUORINE-CONTAINING COMPOUND | AGC Inc. (JP) | 2022-06-30 | — | — | US | disclosed |
| WO-2021161905-A1 | FLUOROETHER COMPOUND, FLUOROETHER COMPOSITION, COATING FLUID, ARTICLE, AND METHOD FOR PRODUCING ARTICLE | ＡＧＣ株式会社 | 2021-08-19 | — | — | WO | disclosed |
| WO-2021060537-A1 | FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING COMPOUND-CONTAINING COMPOSITION, COATING SOLUTION, ARTICLE, AND METHOD FOR PRODUCING ARTICLE | ＡＧＣ株式会社 | 2021-04-01 | — | — | WO | disclosed |
| WO-2021054414-A1 | METHOD FOR PRODUCING FLUORINE-CONTAINING COMPOUNDS | ＡＧＣ株式会社 | 2021-03-25 | — | — | WO | disclosed |
| WO-2021054413-A1 | FLUORINE-CONTAINING ETHER COMPOUND, SURFACE TREATMENT AGENT, FLUORINE-CONTAINING ETHER COMPOSITION, COATING LIQUID, ARTICLE, AND COMPOUND | ＡＧＣ株式会社 | 2021-03-25 | — | — | WO | disclosed |
| US-8066914-B2 | 7-ethynyl-2,4,9-trithiaadamantane and related methods | UNIVERSITY OF AKRON (US) | 2011-11-29 | — | — | US | disclosed |
| US-20100072425-A1 | 7-ETHYNYL-2,4,9-TRITHIAADAMANTANE AND RELATED METHODS | THE UNIVERSITY OF AKRON (US) | 2010-03-25 | — | — | US | disclosed |
| US-7501529-B2 | 7-Ethynyl-2,4,9-trithiaadamantane and related methods | THE UNIVERSITY OF AKRON (US) | 2009-03-10 | — | — | US | disclosed |
| US-20080177094-A1 | 7-Ethynyl-2,4,9-Trithiaadamantane and Related Methods | AKRON, THE UNIVERSITY OF | 2008-07-24 | — | — | US | disclosed |
| WO-2005003089-A2 | 7-ETHYNYL-2,4,9-TRITHIAADAMANTANE AND RELATED METHODS | THE UNIVERSITY OF AKRON (US) | 2005-01-13 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230120739-A1 | FLUORINE-CONTAINING ETHER COMPOUND AND METHOD OF MANUFACTURING THE SAME, COMPOUND AND METHOD OF MANUFACTURING THE SAME, FLUORINE-CONTAINING ETHER COMPOSITION, COATING LIQUID, AND ARTICLE AND METHOD OF MANUFACTURING THE SAME | AFF1, CHRM1, CHRM2 | CYP4F2 80/4885CYP4A11 397/4885ALDH1A1 1041/4885 |
| US-20220213345-A1 | FLUORINE-CONTAINING ETHER COMPOUND, SURFACE TREATMENT AGENT, FLUORINE-CONTAINING ETHER COMPOSITION, COATING LIQUID, ARTICLE, AND COMPOUND | AFF2, AFF1, AFF4 | CYP4F2 117/4885CYP4A11 2139/4885ALDH1A1 2634/4885 |
| US-20080177094-A1 | 7-Ethynyl-2,4,9-Trithiaadamantane and Related Methods | ALKBH2, TET1, AOX1 | CYP4F2 1358/4885CYP4A11 319/4885ALDH1A1 8/4885 |
| US-20100072425-A1 | 7-ETHYNYL-2,4,9-TRITHIAADAMANTANE AND RELATED METHODS | ALKBH2, AOX1, TET1 | CYP4F2 1386/4885CYP4A11 332/4885ALDH1A1 12/4885 |
| US-20220204444-A1 | METHOD OF MANUFACTURING FLUORINE-CONTAINING COMPOUND | AFF2, AFF4, AFF1 | CYP4F2 23/4885CYP4A11 940/4885ALDH1A1 1100/4885 |
| US-20230399293-A1 | METHOD FOR PRODUCING FLUORINE-CONTAINING COMPOUND AND FLUORINE-CONTAINING COMPOUND | AFF1, AFF4, AFF2 | CYP4F2 383/4885CYP4A11 1083/4885ALDH1A1 1429/4885 |
| US-20230220236-A1 | COMPOSITION, SUBSTRATE WITH SURFACE LAYER, METHOD FOR PRODUCING SUBSTRATE WITH SURFACE LAYER, COMPOUNDS, AND METHODS FOR PRODUCING COMPOUNDS | ZRANB2, ITGB1, ITGB2 | CYP4F2 1551/4885CYP4A11 3149/4885ALDH1A1 1997/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.