SCHEMBL13614013

SCHEMBL13614013

CCC(C)C(=O)OC(OC)C1(C)C2CC3CC(C2)CC1C3

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16591160 0.79 ALDH1A1 (0.43) ALDH1A1
SCHEMBL13614000 0.76 CYP17A1 (0.30)
SCHEMBL13932771 0.75 CYP17A1 (0.32) ALDH1A1
SCHEMBL11948968 0.74 CYP17A1 (0.36) ALDH1A1
SCHEMBL683427 0.74 ALDH1A1 (0.34) ALDH1A1
SCHEMBL110539 0.74 CYP17A1 (0.40) ALDH1A1
SCHEMBL13614011 0.73 ALDH1A1 (0.30) ALDH1A1
SCHEMBL13932776 0.71 CYP17A1 (0.33) ALDH1A1
SCHEMBL786051 0.70 ALDH1A1 (0.33) ALDH1A1
SCHEMBL9924480 0.70 ALDH1A1 (0.33) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7611821-B2 Positive resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-03 US disclosed
US-20080008961-A1 POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-01-10 US disclosed