SCHEMBL13614000

SCHEMBL13614000

CCC(C)(C)C(=O)OC(OC)C1(C)C2CC3CC(C2)CC1C3

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 1/20 0.30
CYP19A1 P11511 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13613996 0.80 ALDH1A1 (0.39)
SCHEMBL13614010 0.79
SCHEMBL13614017 0.79 GPR84 (0.34)
SCHEMBL13614013 0.76 ALDH1A1 (0.31)
SCHEMBL13932772 0.75 CYP19A1 (0.38) CYP17A1CYP19A1
SCHEMBL14883929 0.74 CYP17A1 (0.39) CYP17A1CYP19A1
SCHEMBL13614002 0.74 CYP4F2 (0.30)
SCHEMBL47397 0.73 CYP19A1 (0.48) CYP17A1CYP19A1
SCHEMBL47435 0.73 CYP17A1 (0.34) CYP17A1CYP19A1
SCHEMBL106985 0.73 CYP17A1 (0.39) CYP17A1CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7611821-B2 Positive resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-03 US disclosed
US-20080008961-A1 POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-01-10 US disclosed