Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 5/20 | 0.50 |
| ▸ | GABRB2 | P47870 | 5/20 | 0.50 |
| ▸ | MGLL | Q99685 | 1/20 | 0.35 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | SCN5A | Q14524 | 2/20 | 0.34 |
| ▸ | CTSB | P07858 | 1/20 | 0.34 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.34 |
| ▸ | CACNA1C | Q13936 | 1/20 | 0.34 |
| ▸ | CRHR1 | P34998 | 1/20 | 0.34 |
| ▸ | HTR1A | P08908 | 1/20 | 0.33 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6285101 | 0.93 | GABRA1 (0.44) | GABRA1GABRB2MGLLPDK2L3MBTL1 | |
| SCHEMBL16951737 | 0.89 | GABRA1 (0.46) | GABRA1GABRB2L3MBTL1LMNASMN1; SMN2 | |
| SCHEMBL420437 | 0.86 | GABRA1 (0.43) | GABRA1GABRB2MGLLPDK2L3MBTL1 | |
| SCHEMBL2775950 | 0.86 | GABRA1 (0.43) | GABRA1GABRB2SMN1; SMN2TP53TDP1 | |
| SCHEMBL24063978 | 0.84 | GABRA1 (0.41) | GABRA1GABRB2LMNASMN1; SMN2KCNH2 | |
| SCHEMBL11771453 | 0.84 | GABRA1 (0.52) | GABRA1GABRB2 | |
| SCHEMBL26028903 | 0.84 | ALDH1A1 (0.46) | GABRA1GABRB2TDP1TAAR1 | |
| SCHEMBL23760665 | 0.84 | GABRA1 (0.38) | GABRA1GABRB2L3MBTL1LMNASMN1; SMN2 | |
| SCHEMBL29249250 | 0.81 | GABRA1 (0.52) | GABRA1GABRB2MGLLPDK2L3MBTL1 | |
| SCHEMBL16951734 | 0.81 | GABRA1 (0.43) | GABRA1GABRB2L3MBTL1LMNASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1329497-B1 | Utilization of unsaturated esters as perfuming ingredients | FIRMENICH & CIE (CH) | 2010-12-01 | — | — | EP | claimed |
| US-20250264822-A1 | RESIN PARTICLE, TONER, TONER CONTAINING UNIT, DEVELOPER, AND IMAGE FORMING APPARATUS | RICOH COMPANY, LTD. (JP) | 2025-08-21 | — | — | US | disclosed |
| EP-4127039-B1 | HIGH DARKNESS AND HIGH GLOSS DIMENSIONALLY STABLE THERMOPLASTIC SMMA MOLDING COMPOSITION | INEOS STYROLUTION GROUP GMBH (DE) | 2024-11-20 | — | — | EP | disclosed |
| EP-4251696-B1 | UV RESISTANT SMMA COPOLYMERS WITH LOW HAZE AND HIGH CLARITY | INEOS STYROLUTION GROUP GMBH (DE) | 2024-11-20 | — | — | EP | disclosed |
| US-20240317968-A1 | HIGH CLARITY AND LOW HAZE UV STABILIZED STYRENE AND METHYL METHACRYLATE COPOLYMERS | INEOS STYROLUTION GROUP GMBH (DE) | 2024-09-26 | — | — | US | disclosed |
| CN-118234789-A | High clarity, low haze and UV stable styrene-methyl methacrylate copolymers | 英力士苯领集团股份公司 | 2024-06-21 | — | — | CN | disclosed |
| US-20240010825-A1 | UV RESISTANT SMMA COPOLYMERS WITH LOW HAZE AND HIGH CLARITY | INEOS STYROLUTION GROUP GMBH (DE) | 2024-01-11 | — | — | US | disclosed |
| EP-4251696-A1 | UV RESISTANT SMMA COPOLYMERS WITH LOW HAZE AND HIGH CLARITY | INEOS Styrolution Group GmbH (DE) | 2023-10-04 | — | — | EP | disclosed |
| CN-116710517-A | Low haze and high clarity anti-UV SMMA copolymers | 英力士苯领集团股份公司 | 2023-09-05 | — | — | CN | disclosed |
| US-20230183404-A1 | HIGH DARKNESS AND HIGH GLOSS DIMENSIONALLY STABLE THERMOPLASTIC SMMA MOLDING COMPOSITION | INEOS STYROLUTION GROUP GMBH (DE) | 2023-06-15 | — | — | US | disclosed |
| EP-1273976-A1 | TONER FOR ELECTROSTATIC IMAGE DEVELOPMENT AND PROCESS FOR PRODUCING THE SAME | Zeon Corporation (JP) | 2003-01-08 | — | — | EP | disclosed |
| US-6342328-B1 | BINDER RESIN, COLOR AND CHARGE CONTROL AGENT | NIPPON ZEON CO., LTD. (JP) | 2002-01-29 | — | — | US | disclosed |
| EP-0739916-A2 | Multimodal resin systems without emulsifier and solvent | Vianova Resins GmbH (DE) | 1996-10-30 | — | — | EP | disclosed |
| US-5545678-A | CONTAINING EPOXIDE OR CARBONATE WITH AMINE AND PHENOL | HOECHST AKTIENGESELLSCHAFT (DE) | 1996-08-13 | — | — | US | disclosed |
| EP-0656384-A2 | Polymer systems, method of producing same and their application in inks | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-06-07 | — | — | EP | disclosed |
| US-4239806-A | ADHESIVE COMPRISING A BLOCK COPOLYMER OF STYRENE, A CONJUGATED DIENE, AND A HYDROCARBYL SUBSTITUTED STYRENE | PHILLIPS PETROLEUM COMPANY (US) | 1980-12-16 | — | — | US | disclosed |
| US-4198531-A | Manufacture of p-alkylphenols | BASF AKTIENGESELLSCHAFT (DE) | 1980-04-15 | — | — | US | disclosed |
| US-4178275-A | Block copolymers of dienes and hydrocarbyl-substituted styrenes as adhesives | PHILLIPS PETROLEUM COMPANY (US) | 1979-12-11 | — | — | US | disclosed |
| US-4138591-A | Manufacture of alkylphenols | BASF AKTIENGESELLSCHAFT (DE) | 1979-02-06 | — | — | US | disclosed |
| US-4136137-A | PRESSURE SENSITIVE ADHESIVES | PHILLIPS PETROLEUM COMPANY (US) | 1979-01-23 | — | — | US | disclosed |