⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12918355 | 0.78 | TSHR (0.39) | — | |
| SCHEMBL2611793 | 0.75 | — | — | |
| SCHEMBL19929344 | 0.75 | HSD11B1 (0.31) | — | |
| SCHEMBL21939499 | 0.74 | — | — | |
| SCHEMBL13679160 | 0.73 | SLC22A2 (0.30) | — | |
| SCHEMBL10073699 | 0.72 | — | — | |
| SCHEMBL13870787 | 0.71 | — | — | |
| SCHEMBL9608680 | 0.71 | ALDH1A1 (0.33) | — | |
| SCHEMBL13998868 | 0.70 | — | — | |
| SCHEMBL683427 | 0.69 | ALDH1A1 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9170489-B2 | Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device | FUJIFILM CORPORATION (JP) | 2015-10-27 | — | — | US | disclosed |
| EP-2100870-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | JSR Corporation (JP) | 2009-09-16 | — | — | EP | disclosed |