SCHEMBL13713554

SCHEMBL13713554

O=S(=O)(O)c1c(F)c(F)c(CCc2ccccc2)c(F)c1F

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA2 P00918 7/20 0.47
▸ CA13 Q8N1Q1 7/20 0.47
▸ CA12 O43570 6/20 0.47
▸ CA1 P00915 6/20 0.47
▸ CA7 P43166 6/20 0.47
▸ KDM4E B2RXH2 1/20 0.42
▸ ALDH1A1 P00352 1/20 0.42
▸ LMNA P02545 1/20 0.42
▸ CYP3A4 P08684 1/20 0.42
▸ GAA P10253 1/20 0.42
▸ MAPT P10636 1/20 0.42
▸ BLM P54132 1/20 0.42
▸ GFER P55789 1/20 0.42
▸ PMP22 Q01453 1/20 0.42
▸ CA9 Q16790 2/20 0.40
▸ FFAR1 O14842 1/20 0.39
▸ TSHR P16473 2/20 0.38
▸ TAAR1 Q96RJ0 1/20 0.37
▸ FAAH O00519 1/20 0.37
▸ PRSS1 P07477 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phenethylamine SCHEMBL28996433 0.81 TAAR1 (0.53) CA2CA13CA12CA1CA7
Sulfuric Acid SCHEMBL1607638 0.74 ALDH1A1 (0.65) CA2CA1KDM4EALDH1A1LMNA
Biphenyl SCHEMBL5404337 0.74 TSHR (0.44) CA2CA13CA12CA1CA7
SCHEMBL13713549 0.73 POLB (0.41) CA2CA13CA12CA1CA7
SCHEMBL13988675 0.73 CA1 (0.72) CA2CA13CA12CA1CA7
SCHEMBL17257738 0.72 CA2 (0.35) CA2CA13CA12CA1CA7
SCHEMBL7048111 0.72 TSHR (0.67) CA2CA13CA12CA1CA7
Aniline SCHEMBL30744093 0.71 TSHR (0.44) CA2CA13CA12CA1CA7
SCHEMBL13718432 0.70 TSHR (0.74) CA2CA13CA12CA1CA7
Trifluoromethanesulfonic Acid SCHEMBL3362549 0.70 ALDH1A1 (0.50) CA2CA1KDM4EALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592126-B2 Positive resist composition and pattern forming method using the resist composition FUJIFILM CORPORATION (JP) 2009-09-22 — — US disclosed
Send feedback