SCHEMBL13713664

SCHEMBL13713664

CCC(C(F)(F)C(CC)S(=O)(=O)N1CCCC2CCCCC21)S(=O)(=O)O

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13713657 0.90
SCHEMBL13713648 0.81 MAPT (0.30) MAPT
SCHEMBL13713614 0.77
SCHEMBL13713665 0.76 CA1 (0.31) MAPT
SCHEMBL13713638 0.76 CA1 (0.31) MAPT
SCHEMBL13713602 0.76 CA1 (0.31) MAPT
SCHEMBL13713603 0.70 SMN1; SMN2 (0.36)
SCHEMBL12256286 0.70 MAPT (0.38) MAPT
SCHEMBL9609290 0.68 MAPT (0.35) MAPT
SCHEMBL15925414 0.68 HSD11B1 (0.34) MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592126-B2 Positive resist composition and pattern forming method using the resist composition FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed