Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PIM1 | P11309 | 1/20 | 0.43 |
| ▸ | PIM3 | Q86V86 | 1/20 | 0.43 |
| ▸ | PIM2 | Q9P1W9 | 1/20 | 0.43 |
| ▸ | ROCK2 | O75116 | 2/20 | 0.41 |
| ▸ | KDM1A | O60341 | 1/20 | 0.36 |
| ▸ | MAOA | P21397 | 1/20 | 0.36 |
| ▸ | NAMPT | P43490 | 10/20 | 0.36 |
| ▸ | PIK3CA | P42336 | 1/20 | 0.35 |
| ▸ | MTOR | P42345 | 1/20 | 0.35 |
| ▸ | MAPK7 | Q13164 | 1/20 | 0.33 |
| ▸ | HPGDS | O60760 | 1/20 | 0.33 |
| ▸ | BLM | P54132 | 1/20 | 0.33 |
| ▸ | MDM2 | Q00987 | 1/20 | 0.33 |
| ▸ | NTRK1 | P04629 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12057465 | 0.80 | MDM2 (0.33) | MDM2 | |
| SCHEMBL13715928 | 0.78 | PIM1 (0.42) | PIM1PIM3PIM2KDM1AMAOA | |
| SCHEMBL27370987 | 0.77 | MAP4K4 (0.34) | PIM1PIM3PIM2 | |
| SCHEMBL13715636 | 0.76 | MDM2 (0.63) | MDM2 | |
| SCHEMBL13715672 | 0.76 | SMN1; SMN2 (0.57) | PIM1PIM3ROCK2MAOA | |
| SCHEMBL1148266 | 0.75 | NPC1 (0.32) | PIM1PIM3 | |
| SCHEMBL13715634 | 0.75 | RAB9A (0.56) | NAMPT | |
| SCHEMBL13743913 | 0.74 | RAB9A (0.52) | — | |
| SCHEMBL9720272 | 0.72 | ROCK2 (0.71) | PIM1PIM3PIM2ROCK2MAOA | |
| SCHEMBL13373412 | 0.72 | PIM1 (0.47) | PIM1PIM3PIM2ROCK2KDM1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090203215-A1 | METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD | FUJIFILM CORPORATION (JP) | 2009-08-13 | — | — | US | disclosed |
| US-20090203215-A1 | METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD | FUJIFILM CORPORATION (JP) | 2009-08-13 | — | — | US | disclosed |