SCHEMBL13715928

SCHEMBL13715928

O=C(Nc1nnn[nH]1)c1cn[nH]c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PIM1 P11309 1/20 0.42
▸ PIM3 Q86V86 1/20 0.42
▸ PIM2 Q9P1W9 1/20 0.42
▸ IKBKE Q14164 1/20 0.41
▸ TBK1 Q9UHD2 1/20 0.41
▸ ROCK1 Q13464 1/20 0.40
▸ BTK Q06187 1/20 0.36
▸ ALPL P05186 5/20 0.35
▸ KDM1A O60341 1/20 0.35
▸ MAOA P21397 1/20 0.35
▸ CYP3A4 P08684 1/20 0.34
▸ CYP19A1 P11511 1/20 0.34
▸ CYP2C9 P11712 1/20 0.34
▸ MELK Q14680 1/20 0.34
▸ NPC1 O15118 3/20 0.33
▸ RAB9A P51151 2/20 0.33
▸ ALDH1A1 P00352 1/20 0.33
▸ HTT P42858 1/20 0.33
▸ CFTR P13569 1/20 0.33
▸ SMN1; SMN2 Q16637 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12892192 0.81 KDM4E (0.46) BTKALPLNPC1RAB9AHTT
SCHEMBL13876946 0.81 ALPL (0.40) BTKALPLNPC1RAB9ASMN1; SMN2
SCHEMBL13715839 0.78 PIM1 (0.43) PIM1PIM3PIM2KDM1AMAOA
SCHEMBL151398 0.77 NPC1 (0.50) BTKCYP2C9NPC1RAB9AHTT
SCHEMBL13715916 0.77 GAA (0.55) CYP3A4RAB9AALDH1A1HTTL3MBTL1
SCHEMBL13446715 0.75 NQO2 (0.42) BTKALPLNPC1RAB9A
SCHEMBL153149 0.75 LMNA (0.58) PIM1PIM3PIM2ROCK1NPC1
SCHEMBL9034926 0.74 BTK (0.39) BTKALPLNPC1RAB9AHTT
SCHEMBL16326314 0.74 KMT2A (0.49) BTKALPLNPC1RAB9AALDH1A1
SCHEMBL5251301 0.74 NPC1 (0.50) ALPLCYP3A4NPC1RAB9AHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090203215-A1 METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-08-13 — — US disclosed
US-20090203215-A1 METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-08-13 — — US disclosed
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