SCHEMBL1373546

SCHEMBL1373546

CCN(C)C(=O)CCOC(C)(C)C

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.31
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1373669 0.85 EPHX2 (0.33) ALDH1A1
SCHEMBL1376426 0.82 LMNA (0.52) LMNAALDH1A1
SCHEMBL1373027 0.81 ALDH1A1 (0.43) ALDH1A1
SCHEMBL19184844 0.78
SCHEMBL1375732 0.77 ALDH1A1 (0.41) LMNAALDH1A1
SCHEMBL1375496 0.77 LMNA (0.39) LMNAALDH1A1
SCHEMBL1377038 0.76 HPGD (0.43) LMNAALDH1A1
SCHEMBL1373628 0.74 ALDH1A1 (0.50) LMNAALDH1A1
SCHEMBL1373152 0.73 ALDH1A1 (0.35) LMNAALDH1A1
SCHEMBL21341604 0.72 LMNA (0.34) LMNAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2824150-B1 Inkjet ink set and image forming method FUJIFILM CORP (JP) 2017-09-20 EP disclosed
EP-2902454-B1 INK COMPOSITION, INK SET, AND IMAGE FORMING METHOD FUJIFILM CORP (JP) 2017-04-19 EP disclosed
US-9346968-B2 Ink composition, ink set, and image forming method FUJIFILM CORPORATION (JP) 2016-05-24 US disclosed
EP-2902454-A1 INK COMPOSITION, INK SET, AND IMAGE FORMING METHOD Fujifilm Corporation (JP) 2015-08-05 EP disclosed
US-20150175819-A1 INK COMPOSITION, INK SET, AND IMAGE FORMING METHOD FUJIFILM CORPORATION (JP) 2015-06-25 US disclosed
EP-2824150-A1 Inkjet ink set and image forming method FUJIFILM Corporation (JP) 2015-01-14 EP disclosed
US-8563495-B2 Resist remover composition and method for removing resist using same IDEMITSU KOSAN CO., LTD. (JP) 2013-10-22 US disclosed
US-20110287995-A1 RESIST REMOVER COMPOSITION AND METHOD FOR REMOVING RESIST USING SAME IDEMITSU KOSAN CO., LTD. (JP) 2011-11-24 US disclosed