SCHEMBL1376426

SCHEMBL1376426

CCN(CC)C(=O)CCOC(C)(C)C

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 5/20 0.52
NPC1 O15118 3/20 0.36
TSHR P16473 2/20 0.36
HPGD P15428 2/20 0.36
RAB9A P51151 2/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
MMP1 P03956 1/20 0.35
MMP2 P08253 1/20 0.35
MMP3 P08254 1/20 0.35
MMP8 P22894 1/20 0.35
ALOX15 P16050 1/20 0.34
MAPK1 P28482 1/20 0.34
HSD17B10 Q99714 1/20 0.34
ALDH1A1 P00352 2/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
MLYCD O95822 1/20 0.31
HSP90AA1 P07900 1/20 0.31
HSP90AB1 P08238 1/20 0.31
RECQL P46063 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1377038 0.89 HPGD (0.43) LMNANPC1TSHRHPGDRAB9A
SCHEMBL1373628 0.84 ALDH1A1 (0.50) LMNATSHRHPGDSMN1; SMN2MAPK1
SCHEMBL1373546 0.82 LMNA (0.31) LMNAALDH1A1
SCHEMBL16353845 0.81 MMP1 (0.43) LMNAHPGDMMP1MMP2MMP3
SCHEMBL1373027 0.78 ALDH1A1 (0.43) MAPK1HSD17B10ALDH1A1
SCHEMBL13225636 0.78 LMNA (0.44) LMNANPC1TSHRRAB9AMMP1
SCHEMBL118991 0.78 LMNA (0.61) LMNANPC1TSHRHPGDRAB9A
SCHEMBL1373847 0.76 LMNA (0.58) LMNANPC1TSHRHPGDRAB9A
SCHEMBL19184844 0.75
SCHEMBL1373669 0.75 EPHX2 (0.33) HPGDALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 234 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12637804-B2 Ink jet recording method SEIKO EPSON CORPORATION (JP) 2026-05-26 US disclosed
US-12637578-B2 Ink jet ink composition and recording method SEIKO EPSON CORPORATION (JP) 2026-05-26 US disclosed
US-12630973-B2 Recording method SEIKO EPSON CORPORATION (JP) 2026-05-19 US disclosed
US-12630728-B2 Ink set and recording method SEIKO EPSON CORPORATION (JP) 2026-05-19 US disclosed
US-12629934-B2 Recording method and recording device SEIKO EPSON CORPORATION (JP) 2026-05-19 US disclosed
US-12624242-B2 Water-based coloring composition, coloring method, pigment dispersion liquid, and metal pigment producing method SEIKO EPSON CORPORATION (JP) 2026-05-12 US disclosed
US-20260125850-A1 Pretreatment Liquid For Textile Printing And Textile Printing Method SEIKO EPSON CORP (JP) 2026-05-07 US disclosed
US-20260116073-A1 Maintenance Method And Recording Apparatus SEIKO EPSON CORP (JP) 2026-04-30 US disclosed
US-20260109872-A1 Ink Jet Ink Composition And Ink Jet Recording Method SEIKO EPSON CORP (JP) 2026-04-23 US disclosed
US-12584030-B2 Ink jet ink composition and recording method SEIKO EPSON CORPORATION (JP) 2026-03-24 US disclosed
US-20180282564-A1 AQUEOUS INK JET INK COMPOSITION AND INK JET RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2018-10-04 US disclosed
US-20180086112-A1 REACTION SOLUTION AND INK JET RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2018-03-29 US disclosed
EP-2824150-B1 Inkjet ink set and image forming method FUJIFILM CORP (JP) 2017-09-20 EP disclosed
EP-2902454-B1 INK COMPOSITION, INK SET, AND IMAGE FORMING METHOD FUJIFILM CORP (JP) 2017-04-19 EP disclosed
US-9346968-B2 Ink composition, ink set, and image forming method FUJIFILM CORPORATION (JP) 2016-05-24 US disclosed
EP-2902454-A1 INK COMPOSITION, INK SET, AND IMAGE FORMING METHOD Fujifilm Corporation (JP) 2015-08-05 EP disclosed
US-20150175819-A1 INK COMPOSITION, INK SET, AND IMAGE FORMING METHOD FUJIFILM CORPORATION (JP) 2015-06-25 US disclosed
EP-2824150-A1 Inkjet ink set and image forming method FUJIFILM Corporation (JP) 2015-01-14 EP disclosed
US-8563495-B2 Resist remover composition and method for removing resist using same IDEMITSU KOSAN CO., LTD. (JP) 2013-10-22 US disclosed
US-20110287995-A1 RESIST REMOVER COMPOSITION AND METHOD FOR REMOVING RESIST USING SAME IDEMITSU KOSAN CO., LTD. (JP) 2011-11-24 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (10 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260125850-A1 Pretreatment Liquid For Textile Printing And Textile Printing Method ADH1A, RARA, RBP4 LMNA 494/4885NPC1 4447/4885TSHR 4678/4885
US-12624242-B2 Water-based coloring composition, coloring method, pigment dispersion liquid, and metal pigment producing method HAO2, PHOSPHO1, HAO1 LMNA 2527/4885NPC1 2753/4885TSHR 1160/4885
US-20260109872-A1 Ink Jet Ink Composition And Ink Jet Recording Method COPE, EED, VCL LMNA 3253/4885NPC1 3088/4885TSHR 4692/4885
US-12637578-B2 Ink jet ink composition and recording method TYR, RB1, WNT1 LMNA 4399/4885NPC1 1216/4885TSHR 3228/4885
US-12630973-B2 Recording method DOT1L, EMD, EZH2 LMNA 358/4885NPC1 4427/4885TSHR 3373/4885
US-20260116073-A1 Maintenance Method And Recording Apparatus WFS1, HCN2, SMN1; SMN2 LMNA 1289/4885NPC1 225/4885TSHR 2142/4885
US-12629934-B2 Recording method and recording device HCN2, MC1R, TYR LMNA 519/4885NPC1 2046/4885TSHR 2648/4885
US-12630728-B2 Ink set and recording method DOT1L, SET, ALKBH3 LMNA 1607/4885NPC1 2842/4885TSHR 4820/4885
US-12637804-B2 Ink jet recording method IK, PRPH, SLC6A19 LMNA 3315/4885NPC1 2040/4885TSHR 1740/4885
US-12584030-B2 Ink jet ink composition and recording method LSM8, SMURF1, SMAD3 LMNA 2067/4885NPC1 236/4885TSHR 3709/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.