SCHEMBL13744339

SCHEMBL13744339

CCC(C)(F)C(=O)OC(C(F)(F)F)C(F)(F)F

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ABHD6 Q9BV23 1/20 0.32
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12157371 0.86
SCHEMBL14505674 0.84
SCHEMBL2735059 0.83 ABHD6 (0.32) ABHD6CA1CA2
SCHEMBL2681158 0.83 ABHD6 (0.32) ABHD6CA1CA2
SCHEMBL19135829 0.83 PRKCA (0.32) ABHD6CA1CA2
SCHEMBL23809794 0.82
SCHEMBL14505668 0.82
SCHEMBL29321016 0.82 MMP8 (0.33)
SCHEMBL14510830 0.82
SCHEMBL17378156 0.81 TSHR (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7569323-B2 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-04 US disclosed
US-20070026341-A1 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-02-01 US disclosed