SCHEMBL1374443

SCHEMBL1374443

CCCCCCOCCC(=O)N(CC)CC

nearest known ligand 0.52

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.52
CES2 O00748 3/20 0.48
MEN1 O00255 1/20 0.47
THRB P10828 1/20 0.47
HTT P42858 1/20 0.47
KMT2A Q03164 1/20 0.47
MAPT P10636 1/20 0.47
ZDHHC20 Q5W0Z9 1/20 0.42
LPAR3 Q9UBY5 3/20 0.41
LPAR1 Q92633 2/20 0.41
LPAR2 Q9HBW0 2/20 0.41
NAAA Q02083 1/20 0.41
DGKA P23743 1/20 0.41
CES1 P23141 2/20 0.41
LPAR5 Q9H1C0 1/20 0.39
EPHX1 P07099 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17200855 1.00 LMNA (0.52) LMNACES2MEN1THRBHTT
SCHEMBL9632668 1.00 LMNA (0.52) LMNACES2MEN1THRBHTT
SCHEMBL5163304 1.00 LMNA (0.52) LMNACES2MEN1THRBHTT
SCHEMBL1376874 0.98 LMNA (0.54) LMNACES2MEN1THRBHTT
SCHEMBL31664524 0.93 LMNA (0.57) LMNACES2MEN1THRBHTT
SCHEMBL1374359 0.92 LMNA (0.56) LMNACES2MEN1THRBHTT
SCHEMBL1373691 0.91 CES2 (0.44) LMNACES2MEN1THRBHTT
SCHEMBL31664502 0.91 LMNA (0.59) LMNACES2MEN1THRBHTT
SCHEMBL1373263 0.89 LMNA (0.44) LMNACES2MEN1THRBHTT
SCHEMBL1375414 0.87 CES2 (0.47) CES2MEN1THRBHTTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118367148-A Negative electrode binder composition, slurry composition, negative electrode, and secondary battery 上海百公里新材料科技有限公司 2024-07-19 CN claimed
US-20250236812-A1 CLEANING AGENT COMPOSITION FOR SEMICONDUCTOR CLEANING, AND METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-07-24 US disclosed
US-20240218198-A1 RECORDING LIQUID SET, PRINTED MATTER PRODUCING METHOD, AND PRINTED MATTER TOYO INK SC HOLDINGS CO., LTD. (JP) 2024-07-04 US disclosed
US-20240010860-A1 CHROMATIC PROCESS COLOR INKJET INK TOYO INK SC HOLDINGS CO., LTD. (JP) 2024-01-11 US disclosed
US-11866599-B2 Ink set and printing method DAI NIPPON TORYO CO., LTD. (JP) 2024-01-09 US disclosed
EP-4286484-A1 AQUEOUS PRETREATMENT LIQUID, INK SET, PRINTED ITEM, AND SEPARATION METHOD Toyo Ink SC Holdings Co., Ltd. (JP) 2023-12-06 EP disclosed
WO-2023195274-A1 RECORDING LIQUID SET, PRINTED MATTER MANUFACTURING METHOD, AND PRINTED MATTER 東洋インキSCホールディングス株式会社 2023-10-12 WO disclosed
EP-4257646-A1 CHROMATIC PROCESS COLOR INKJET INK Toyo Ink SC Holdings Co., Ltd. (JP) 2023-10-11 EP disclosed
EP-3653678-B1 INK SET AND METHOD FOR PRODUCING PRINTED MATTER TOYO INK SC HOLDINGS CO LTD (JP) 2023-09-06 EP disclosed
EP-3653679-B1 INK SET AND METHOD FOR PRODUCING PRINTED MATTER TOYO INK SC HOLDINGS CO LTD (JP) 2023-09-06 EP disclosed
US-20150307687-A1 INKJET MAINTENANCE FLUID DNP FINE CHEMICALS CO., LTD. (JP) 2015-10-29 US disclosed
EP-2682269-B1 METHOD FOR CLEANING INKJET RECORDING HEAD, AND METHOD FOR FORMING IMAGE KONICA MINOLTA INC (JP) 2015-10-07 EP disclosed
EP-2568019-B1 Inkjet ink JNC CORP (JP) 2015-09-02 EP disclosed
EP-2902454-A1 INK COMPOSITION, INK SET, AND IMAGE FORMING METHOD Fujifilm Corporation (JP) 2015-08-05 EP disclosed
US-20150175819-A1 INK COMPOSITION, INK SET, AND IMAGE FORMING METHOD FUJIFILM CORPORATION (JP) 2015-06-25 US disclosed
EP-2824150-A1 Inkjet ink set and image forming method FUJIFILM Corporation (JP) 2015-01-14 EP disclosed
US-20140085376-A1 METHOD FOR CLEANING INKJET RECORDING HEAD, AND METHOD FOR FORMING IMAGE Konica Minolta, Inc. (JP) 2014-03-27 US disclosed
US-8563495-B2 Resist remover composition and method for removing resist using same IDEMITSU KOSAN CO., LTD. (JP) 2013-10-22 US disclosed
EP-2568019-A1 Inkjet ink JNC Corporation (JP) 2013-03-13 EP disclosed
US-20110287995-A1 RESIST REMOVER COMPOSITION AND METHOD FOR REMOVING RESIST USING SAME IDEMITSU KOSAN CO., LTD. (JP) 2011-11-24 US disclosed