SCHEMBL1375414

SCHEMBL1375414

CCCCCCOCCC(=O)N(CCC)CCC

nearest known ligand 0.47

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CES2 O00748 2/20 0.47
ALDH1A1 P00352 1/20 0.47
HPGD P15428 1/20 0.47
MEN1 O00255 1/20 0.46
THRB P10828 1/20 0.46
HTT P42858 1/20 0.46
KMT2A Q03164 1/20 0.46
MAPT P10636 1/20 0.46
ZDHHC20 Q5W0Z9 1/20 0.44
DNM1 Q05193 1/20 0.41
LPAR3 Q9UBY5 3/20 0.40
LPAR1 Q92633 2/20 0.40
LPAR2 Q9HBW0 2/20 0.40
NAAA Q02083 1/20 0.40
DGKA P23743 1/20 0.40
CES1 P23141 1/20 0.40
LPAR5 Q9H1C0 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1373604 0.98 ALDH1A1 (0.48) CES2ALDH1A1HPGDMEN1THRB
SCHEMBL1373691 0.93 CES2 (0.44) CES2ALDH1A1HPGDMEN1THRB
SCHEMBL31664495 0.93 CES2 (0.47) CES2ALDH1A1HPGDMEN1THRB
SCHEMBL31664492 0.93 CES2 (0.47) CES2MEN1THRBHTTKMT2A
SCHEMBL31664498 0.93 CES2 (0.47) CES2ALDH1A1HPGDMEN1THRB
SCHEMBL1376984 0.93 ALDH1A1 (0.50) CES2ALDH1A1HPGDZDHHC20
SCHEMBL1373263 0.91 LMNA (0.44) CES2ALDH1A1HPGDMEN1THRB
SCHEMBL31664504 0.91 ALDH1A1 (0.48) CES2ALDH1A1HPGDMEN1THRB
SCHEMBL31664497 0.91 CES2 (0.44) CES2ALDH1A1HPGDMEN1THRB
SCHEMBL31664537 0.91 CES2 (0.44) CES2ALDH1A1HPGDMEN1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250236812-A1 CLEANING AGENT COMPOSITION FOR SEMICONDUCTOR CLEANING, AND METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-07-24 US disclosed
EP-2568019-B1 Inkjet ink JNC CORP (JP) 2015-09-02 EP disclosed
US-8563495-B2 Resist remover composition and method for removing resist using same IDEMITSU KOSAN CO., LTD. (JP) 2013-10-22 US disclosed
EP-2568019-A1 Inkjet ink JNC Corporation (JP) 2013-03-13 EP disclosed
US-20110287995-A1 RESIST REMOVER COMPOSITION AND METHOD FOR REMOVING RESIST USING SAME IDEMITSU KOSAN CO., LTD. (JP) 2011-11-24 US disclosed