Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 6/20 | 0.33 |
| ▸ | PRKCA | P17252 | 2/20 | 0.33 |
| ▸ | DGKA | P23743 | 1/20 | 0.33 |
| ▸ | LPAR1 | Q92633 | 2/20 | 0.33 |
| ▸ | LPAR3 | Q9UBY5 | 2/20 | 0.33 |
| ▸ | PPM1B | O75688 | 1/20 | 0.33 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.33 |
| ▸ | PPP1CC | P36873 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14417647 | 1.00 | LMNA (0.34) | LMNAPOLBEPHX2PRKCADGKA | |
| SCHEMBL10297365 | 0.99 | LMNA (0.33) | LMNAPOLBEPHX2PRKCADGKA | |
| SCHEMBL12993915 | 0.92 | PRKCA (0.30) | PRKCA | |
| SCHEMBL10155842 | 0.90 | — | — | |
| SCHEMBL681607 | 0.90 | LMNA (0.33) | LMNAPOLBEPHX2PRKCADGKA | |
| SCHEMBL10171015 | 0.90 | LMNA (0.33) | LMNAPOLBEPHX2PRKCADGKA | |
| SCHEMBL14372210 | 0.89 | — | — | |
| SCHEMBL23781846 | 0.89 | LMNA (0.41) | LMNAPOLBDGKALPAR1LPAR3 | |
| SCHEMBL30730430 | 0.89 | LMNA (0.41) | LMNAPOLBDGKALPAR1LPAR3 | |
| SCHEMBL25221602 | 0.89 | LMNA (0.41) | LMNAPOLBDGKALPAR1LPAR3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230331888-A1 | Resin Composition | NIPPON SHOKUBAI CO., LTD. (JP) | 2023-10-19 | — | — | US | disclosed |
| US-20170096522-A1 | EPOXY RESIN COMPOSITION AND CURED PRODUCT OF SAME | DAICEL CORPORATION (JP) | 2017-04-06 | — | — | US | disclosed |
| US-9184355-B2 | Curable resin composition for reflection of light, and optical semiconductor device | DAICEL CORPORATION (JP) | 2015-11-10 | — | — | US | disclosed |
| US-9134617-B2 | Solvent developable negative resist composition, resist pattern formation method, and method for forming pattern of layer including block copolymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-09-15 | — | — | US | disclosed |
| US-20140113236-A1 | SOLVENT DEVELOPABLE NEGATIVE RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND METHOD FOR FORMING PATTERN OF LAYER INCLUDING BLOCK COPOLYMER | RIKEN (JP) | 2014-04-24 | — | — | US | disclosed |
| US-8409715-B2 | Cation-polymerizable resin composition containing multi-branched polyether polyol, adhesive agent comprising the composition, and laminate and polarizing plate using the adhesive agent | DIC CORPORATION (JP) | 2013-04-02 | — | — | US | disclosed |
| US-20090181263-A1 | Cation-Polymerizable Resin Composition Containing Multi-Branched Polyether Polyol, Adhesive Agent Comprising the Composition, and Laminate and Polarizing Plate Using the Adhesive Agent | DIC CORPORATION (JP) | 2009-07-16 | — | — | US | disclosed |
| US-20080285133-A1 | Antireflection Film, Production Method Thereof, Polarizing Plate Using the Antireflection Film and Image Display Device Using the Antireflection Film or Polarizing Plate | FUJIFILM CORPORATION (JP) | 2008-11-20 | — | — | US | disclosed |
| US-20080038672-A1 | METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, AND ELECTRONIC APPARATUS | SEIKO EPSON CORPORATION (JP) | 2008-02-14 | — | — | US | disclosed |