Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | PRKCA | P17252 | 2/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 6/20 | 0.32 |
| ▸ | DGKA | P23743 | 1/20 | 0.32 |
| ▸ | LPAR1 | Q92633 | 3/20 | 0.32 |
| ▸ | LPAR3 | Q9UBY5 | 3/20 | 0.32 |
| ▸ | PPM1B | O75688 | 1/20 | 0.32 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.32 |
| ▸ | PPP1CC | P36873 | 1/20 | 0.32 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10171015 | 1.00 | LMNA (0.33) | LMNAPOLBPRKCAEPHX2DGKA | |
| SCHEMBL13709094 | 0.99 | LMNA (0.33) | LMNAPOLBPRKCAEPHX2PPM1B | |
| SCHEMBL16107235 | 0.95 | LMNA (0.34) | LMNAPOLBPPM1BPTPN1PPP1CC | |
| SCHEMBL25878958 | 0.92 | PRKCA (0.30) | PRKCA | |
| SCHEMBL14417647 | 0.90 | LMNA (0.34) | LMNAPOLBPRKCAEPHX2DGKA | |
| SCHEMBL13776397 | 0.90 | LMNA (0.34) | LMNAPOLBPRKCAEPHX2DGKA | |
| SCHEMBL10297365 | 0.89 | LMNA (0.33) | LMNAPOLBPRKCAEPHX2DGKA | |
| SCHEMBL15681518 | 0.89 | LMNA (0.33) | LMNAPOLBEPHX2LPAR1LPAR3 | |
| SCHEMBL17309080 | 0.89 | EPHX2 (0.33) | LMNAPOLBEPHX2LPAR1LPAR3 | |
| SCHEMBL18910173 | 0.87 | PPM1B (0.34) | EPHX2PPM1BPTPN1PPP1CC |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 86 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240210817-A1 | RESIN MOLDED ARTICLE PRODUCTION METHOD AND OPTICAL COMPONENT PRODUCTION METHOD | DAICEL CORPORATION (JP) | 2024-06-27 | — | — | US | disclosed |
| US-11862936-B2 | Optical member, laser module including said optical member, and laser device | DAICEL CORPORATION (JP) | 2024-01-02 | — | — | US | disclosed |
| US-20230399479-A1 | LAMINATED FILM AND FLEXIBLE DEVICE | DAICEL CORPORATION (JP) | 2023-12-14 | — | — | US | disclosed |
| US-20230331888-A1 | Resin Composition | NIPPON SHOKUBAI CO., LTD. (JP) | 2023-10-19 | — | — | US | disclosed |
| US-20230307407-A1 | MEMBER, CONDUCTIVE LAYER, METHOD FOR MANUFACTURING MEMBER, AND METHOD FOR FORMING CONDUCTIVE LAYER | RICOH COMPANY, LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230242765-A1 | POLYORGANO SILSESQUIOXANE, CURABLE COMPOSITION, CURED PRODUCT, HARD COAT FILM, ADHESIVE SHEET, AND LAMINATE | DAICEL CORPORATION (JP) | 2023-08-03 | — | — | US | disclosed |
| WO-2023128264-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY APPARATUS | 주식회사 동진쎄미켐 | 2023-07-06 | — | — | WO | disclosed |
| US-20230213857-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING RADICAL TRAPPING AGENT | NISSAN CHEMICAL CORPORATION (JP) | 2023-07-06 | — | — | US | disclosed |
| US-20230213857-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING RADICAL TRAPPING AGENT | NISSAN CHEMICAL CORPORATION (JP) | 2023-07-06 | — | — | US | disclosed |
| US-20230212133-A1 | Safe, Environmentally Friendly and Controllable Method for Preparing Cycloaliphatic Diepoxides | JIANGSU TETRA NEW MATERIAL TECHNOLOGY CO., LTD. (CN) | 2023-07-06 | — | — | US | disclosed |
| US-8063156-B2 | Composition containing cycloaliphatic epoxide, polyol oligomer, and curing catalyst | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2011-11-22 | — | — | US | disclosed |
| US-20110114972-A1 | OPTICAL SEMICONDUCTOR SEALING RESIN COMPOSITION AND OPTICAL SEMICONDUCTOR DEVICE USING SAME | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2011-05-19 | — | — | US | disclosed |
| US-20110021722-A1 | COMPOSITION CONTAINING CYCLOALIPHATIC EPOXIDE, POLYOL OLIGOMER, CURING AGENT AND CURING ACCELERATOR | TAKAI HIDEYUKI | 2011-01-27 | — | — | US | disclosed |
| US-7825197-B2 | Composition containing cycloaliphatic epoxide, polyol oligomer, curing agent and curing accelerator | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-02 | — | — | US | disclosed |
| US-20100080925-A1 | INK COMPOSITION AND INKJET RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2010-04-01 | — | — | US | disclosed |
| EP-2169018-A2 | Ink composition and inkjet recording method | Fujifilm Corporation (JP) | 2010-03-31 | — | — | EP | disclosed |
| US-7576142-B2 | Polyorganosiloxane and curable composition containing same | TOAGOSEI CO., LTD. (JP) | 2009-08-18 | — | — | US | disclosed |
| US-20080038672-A1 | METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, AND ELECTRONIC APPARATUS | SEIKO EPSON CORPORATION (JP) | 2008-02-14 | — | — | US | disclosed |
| US-20080033137-A1 | Polyorganosiloxane And Curable Composition Containing Same | TOAGOSEI CO., LTD. (JP) | 2008-02-07 | — | — | US | disclosed |
| US-20070265427-A1 | Thermosetting Epoxy Resin Compositions And Use Thereof | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2007-11-15 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230212133-A1 | Safe, Environmentally Friendly and Controllable Method for Preparing Cycloaliphatic Diepoxides | DDT, EPHX2, HSD11B2 | LMNA 3361/4885POLB 757/4885PRKCA 263/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.