Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23072785 | 0.82 | ALDH1A1 (0.36) | ALDH1A1TSHRTDP1LMNAHSD17B10 | |
| SCHEMBL1121870 | 0.81 | TSHR (0.43) | ALDH1A1TSHRTDP1 | |
| SCHEMBL347723 | 0.80 | ALDH1A1 (0.42) | ALDH1A1TSHRTDP1 | |
| SCHEMBL23417210 | 0.80 | ALOX15 (0.32) | TDP1ALOX15 | |
| Hydrochloric Acid SCHEMBL28854121 | 0.78 | ALDH1A1 (0.41) | ALDH1A1TSHRTDP1 | |
| Ammonia Solution, Strong SCHEMBL1735564 | 0.78 | ALDH1A1 (0.41) | ALDH1A1TSHRTDP1 | |
| SCHEMBL21439784 | 0.77 | ALDH1A1 (0.32) | ALDH1A1TSHRTDP1 | |
| SCHEMBL15279401 | 0.77 | DGAT1 (0.36) | ALDH1A1TDP1 | |
| SCHEMBL155686 | 0.77 | — | — | |
| SCHEMBL30756683 | 0.75 | ALDH1A1 (0.31) | ALDH1A1TSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1835341-B1 | Positive resist composition and pattern forming method using the same | FUJIFILM CORP (JP) | 2009-06-24 | — | — | EP | disclosed |
| EP-1975713-A2 | Positive resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-10-01 | — | — | EP | disclosed |
| EP-1835341-A1 | Positive resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2007-09-19 | — | — | EP | disclosed |
| EP-1835342-A2 | Positive resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2007-09-19 | — | — | EP | disclosed |