SCHEMBL13817675

SCHEMBL13817675

CC12CC3CC(C)(C1)CC(OC(=O)C(C)(C)C)(C2)C(=O)O3

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.32
PTPN1 P18031 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13817674 0.79 L3MBTL1 (0.30) L3MBTL1
SCHEMBL13817676 0.75 NAAA (0.35) L3MBTL1
SCHEMBL440034 0.69 PTPN1 (0.36) PTPN1
SCHEMBL13817683 0.69
SCHEMBL19881160 0.63
SCHEMBL13817681 0.63
SCHEMBL11966900 0.63
SCHEMBL13817666 0.63 PRKCA (0.34) L3MBTL1SMN1; SMN2
SCHEMBL13817677 0.62
SCHEMBL13817678 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7541131-B2 Resist composition, compound for use in the resist composition and pattern forming method using the resist composition FUJIFILM CORPORATION (JP) 2009-06-02 US disclosed
US-7214733-B2 Positive type resist composition FUJI PHOTO FILM CO., LTD. (JP) 2007-05-08 US disclosed
US-7214733-B2 Positive type resist composition FUJI PHOTO FILM CO., LTD. (JP) 2007-05-08 US disclosed