Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 2/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.38 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | BTK | Q06187 | 1/20 | 0.37 |
| ▸ | PHGDH | O43175 | 1/20 | 0.36 |
| ▸ | S1PR3 | Q99500 | 2/20 | 0.36 |
| ▸ | TRPM8 | Q7Z2W7 | 2/20 | 0.36 |
| ▸ | CTSS | P25774 | 1/20 | 0.35 |
| ▸ | CTSK | P43235 | 1/20 | 0.35 |
| ▸ | ADH1C | P00326 | 1/20 | 0.34 |
| ▸ | ADH1A | P07327 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.34 |
| ▸ | RECQL | P46063 | 1/20 | 0.34 |
| ▸ | ADAM17 | P78536 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24292459 | 0.98 | BTK (0.38) | GAATSHREPHX1HSD11B1HPGD | |
| SCHEMBL24292449 | 0.91 | HSD11B1 (0.37) | GAATSHREPHX1HSD11B1HPGD | |
| SCHEMBL27630283 | 0.90 | SLC6A4 (0.39) | GAATSHREPHX1HSD11B1TRPM8 | |
| SCHEMBL27740053 | 0.88 | SLC6A4 (0.38) | GAATSHREPHX1BTKTRPM8 | |
| SCHEMBL25104905 | 0.86 | SLC6A4 (0.47) | — | |
| SCHEMBL13144562 | 0.85 | SLC6A4 (0.38) | BTK | |
| SCHEMBL24292463 | 0.85 | CHRM2 (0.37) | GAATSHREPHX1HSD11B1BTK | |
| SCHEMBL25031797 | 0.84 | BTK (0.38) | GAATSHREPHX1HPGDBTK | |
| SCHEMBL879530 | 0.83 | TSHR (0.36) | GAATSHREPHX1HSD11B1PHGDH | |
| SCHEMBL4552317 | 0.82 | HSD11B1 (0.44) | GAATSHREPHX1HSD11B1HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 923 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108659223-B | Cyclodextrin derivative type photosensitive resin, preparation method thereof, resist composition based on cyclodextrin derivative type photosensitive resin and application of resist composition | 中科院广州化学有限公司南雄材料生产基地 | 2020-12-04 | — | — | CN | claimed |
| WO-2026100282-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMING METHOD, POLYMER, AND ONIUM SALT | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100524-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMING METHOD, ONIUM SALT COMPOUND, AND POLYMER | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100258-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND COMPOUND | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100281-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, RADIATION-SENSITIVE ACID GENERATOR, AND COMPOUND | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100259-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND COMPOUND | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-20260079396-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND | JSR CORPORATION (JP) | 2026-03-19 | — | — | US | disclosed |
| US-20260063994-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND | JSR CORPORATION (JP) | 2026-03-05 | — | — | US | disclosed |
| US-12517429-B2 | Radiation-sensitive resin composition and method for forming pattern | JSR CORPORATION (JP) | 2026-01-06 | — | — | US | disclosed |
| US-20250377590-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2025-12-11 | — | — | US | disclosed |
| EP-1193558-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| US-20020009667-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1162506-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-12 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260079396-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND | SRMS, RAD1, SLC11A2 | GAA 4760/4885TSHR 994/4885EPHX1 4585/4885 |
| US-20260063994-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND | RAD1, RPA1, RAD51 | GAA 4791/4885TSHR 1268/4885EPHX1 3218/4885 |
| US-20250377590-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | RER1, RAD51, RFC2 | GAA 2999/4885TSHR 2803/4885EPHX1 725/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.