SCHEMBL138266

SCHEMBL138266

CC(C)(C)OC(=O)N(C1CCCCC1)C1CCCCC1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.39
TSHR P16473 1/20 0.39
EPHX1 P07099 2/20 0.38
HSD11B1 P28845 1/20 0.38
HPGD P15428 1/20 0.37
BTK Q06187 1/20 0.37
PHGDH O43175 1/20 0.36
S1PR3 Q99500 2/20 0.36
TRPM8 Q7Z2W7 2/20 0.36
CTSS P25774 1/20 0.35
CTSK P43235 1/20 0.35
ADH1C P00326 1/20 0.34
ADH1A P07327 1/20 0.34
KDM4E B2RXH2 1/20 0.34
MEN1 O00255 1/20 0.34
LMNA P02545 1/20 0.34
ALOX15 P16050 1/20 0.34
ALOX12 P18054 1/20 0.34
RECQL P46063 1/20 0.34
ADAM17 P78536 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24292459 0.98 BTK (0.38) GAATSHREPHX1HSD11B1HPGD
SCHEMBL24292449 0.91 HSD11B1 (0.37) GAATSHREPHX1HSD11B1HPGD
SCHEMBL27630283 0.90 SLC6A4 (0.39) GAATSHREPHX1HSD11B1TRPM8
SCHEMBL27740053 0.88 SLC6A4 (0.38) GAATSHREPHX1BTKTRPM8
SCHEMBL25104905 0.86 SLC6A4 (0.47)
SCHEMBL13144562 0.85 SLC6A4 (0.38) BTK
SCHEMBL24292463 0.85 CHRM2 (0.37) GAATSHREPHX1HSD11B1BTK
SCHEMBL25031797 0.84 BTK (0.38) GAATSHREPHX1HPGDBTK
SCHEMBL879530 0.83 TSHR (0.36) GAATSHREPHX1HSD11B1PHGDH
SCHEMBL4552317 0.82 HSD11B1 (0.44) GAATSHREPHX1HSD11B1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 923 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108659223-B Cyclodextrin derivative type photosensitive resin, preparation method thereof, resist composition based on cyclodextrin derivative type photosensitive resin and application of resist composition 中科院广州化学有限公司南雄材料生产基地 2020-12-04 CN claimed
WO-2026100282-A1 RADIATION-SENSITIVE COMPOSITION, PATTERN FORMING METHOD, POLYMER, AND ONIUM SALT JSR株式会社 2026-05-15 WO disclosed
WO-2026100524-A1 RADIATION-SENSITIVE COMPOSITION, PATTERN FORMING METHOD, ONIUM SALT COMPOUND, AND POLYMER JSR株式会社 2026-05-15 WO disclosed
WO-2026100258-A1 RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND COMPOUND JSR株式会社 2026-05-15 WO disclosed
WO-2026100281-A1 RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, RADIATION-SENSITIVE ACID GENERATOR, AND COMPOUND JSR株式会社 2026-05-15 WO disclosed
WO-2026100259-A1 RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND COMPOUND JSR株式会社 2026-05-15 WO disclosed
US-20260079396-A1 RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND JSR CORPORATION (JP) 2026-03-19 US disclosed
US-20260063994-A1 RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND JSR CORPORATION (JP) 2026-03-05 US disclosed
US-12517429-B2 Radiation-sensitive resin composition and method for forming pattern JSR CORPORATION (JP) 2026-01-06 US disclosed
US-20250377590-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN JSR CORPORATION (JP) 2025-12-11 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed
US-20020012872-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-31 US disclosed
US-20020009668-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-24 US disclosed
US-20020009667-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-24 US disclosed
EP-1164434-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed
EP-1164433-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed
EP-1162506-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-12 EP disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed
EP-1085379-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-03-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260079396-A1 RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND SRMS, RAD1, SLC11A2 GAA 4760/4885TSHR 994/4885EPHX1 4585/4885
US-20260063994-A1 RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND RAD1, RPA1, RAD51 GAA 4791/4885TSHR 1268/4885EPHX1 3218/4885
US-20250377590-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN RER1, RAD51, RFC2 GAA 2999/4885TSHR 2803/4885EPHX1 725/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.