Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PDK1 | Q15118 | 1/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.53 |
| ▸ | TSHR | P16473 | 1/20 | 0.53 |
| ▸ | HSD11B1 | P28845 | 10/20 | 0.49 |
| ▸ | HSD11B2 | P80365 | 3/20 | 0.46 |
| ▸ | HPGD | P15428 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.42 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.42 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.42 |
| ▸ | CHRNB3 | Q05901 | 1/20 | 0.42 |
| ▸ | CHRNA6 | Q15825 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | GRM5 | P41594 | 1/20 | 0.41 |
| ▸ | RECQL | P46063 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16238751 | 0.89 | PDK1 (0.54) | PDK1ALDH1A1TSHRHPGDLMNA | |
| SCHEMBL16238475 | 0.83 | PDK1 (0.49) | PDK1ALDH1A1TSHRHSD11B1HPGD | |
| SCHEMBL3516619 | 0.78 | PDK1 (0.66) | PDK1SMN1; SMN2 | |
| SCHEMBL4137922 | 0.78 | PDK1 (0.66) | PDK1SMN1; SMN2 | |
| SCHEMBL27669802 | 0.78 | PDK1 (0.66) | PDK1SMN1; SMN2 | |
| SCHEMBL27024183 | 0.77 | ALDH1A1 (0.63) | ALDH1A1TSHRHSD11B1HSD11B2HPGD | |
| SCHEMBL20827024 | 0.77 | ALDH1A1 (0.63) | ALDH1A1TSHRHSD11B1HSD11B2HPGD | |
| SCHEMBL25501601 | 0.77 | ALDH1A1 (0.63) | ALDH1A1TSHRHSD11B1HSD11B2HPGD | |
| SCHEMBL5245209 | 0.76 | PDK1 (0.55) | PDK1ALDH1A1HPGDLMNA | |
| SCHEMBL12331051 | 0.76 | TSHR (0.47) | ALDH1A1TSHRHSD11B1HSD11B2HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120288796-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-15 | — | — | US | disclosed |
| US-20120288796-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-15 | — | — | US | disclosed |