Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A2 | O15244 | 2/20 | 0.62 |
| ▸ | SLC47A1 | Q96FL8 | 2/20 | 0.62 |
| ▸ | MAPT | P10636 | 1/20 | 0.59 |
| ▸ | GRIN2D | O15399 | 4/20 | 0.56 |
| ▸ | GRIN3B | O60391 | 4/20 | 0.56 |
| ▸ | GRIN1 | Q05586 | 4/20 | 0.56 |
| ▸ | GRIN2A | Q12879 | 4/20 | 0.56 |
| ▸ | GRIN2B | Q13224 | 4/20 | 0.56 |
| ▸ | GRIN2C | Q14957 | 4/20 | 0.56 |
| ▸ | GRIN3A | Q8TCU5 | 4/20 | 0.56 |
| ▸ | NPC1 | O15118 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.45 |
| ▸ | EPHX2 | P34913 | 5/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.38 |
| ▸ | STAT6 | P42226 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL455611 | 1.00 | SLC22A2 (0.62) | SLC22A2SLC47A1MAPTGRIN2DGRIN3B | |
| SCHEMBL31493460 | 0.87 | — | — | |
| SCHEMBL677940 | 0.81 | SLC22A2 (0.62) | SLC22A2SLC47A1MAPTGRIN2DGRIN3B | |
| Acrylic Acid SCHEMBL15051667 | 0.78 | NPC1 (0.44) | SLC22A2SLC47A1MAPTGRIN2DGRIN3B | |
| Methacrylic Acid SCHEMBL12803308 | 0.78 | ALDH1A1 (0.44) | SLC22A2SLC47A1MAPTGRIN2DGRIN3B | |
| SCHEMBL12578209 | 0.78 | SLC22A2 (0.46) | SLC22A2SLC47A1MAPTGRIN2DGRIN3B | |
| SCHEMBL14983838 | 0.78 | SLC22A2 (0.41) | SLC22A2SLC47A1MAPTGRIN2DGRIN3B | |
| SCHEMBL16448484 | 0.78 | SLC22A2 (0.41) | SLC22A2SLC47A1MAPTGRIN2DGRIN3B | |
| SCHEMBL7739624 | 0.77 | SLC22A2 (0.56) | SLC22A2SLC47A1MAPTGRIN2DGRIN3B | |
| Rimantadine SCHEMBL2981 | 0.77 | SLC22A2 (1.00) | SLC22A2SLC47A1MAPTGRIN2DGRIN3B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2533 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115584283-B | Method for preparing adamantane high-density fuel from crude fluorene | 大连理工大学 | 2024-01-30 | — | — | CN | claimed |
| CN-115584283-A | Method for preparing adamantane high-density fuel from crude fluorene | 大连理工大学 | 2023-01-10 | — | — | CN | claimed |
| CN-112851459-A | Method for preparing alkyl adamantane from polycyclic aromatic hydrocarbon | 太原理工大学 | 2021-05-28 | — | — | CN | claimed |
| EP-3068405-B1 | PYRROLO [1,2,F][1,2,4]TRIAZINES USEFUL FOR TREATING RESPIRATORY SYNCITIAL VIRUS INFECTIONS | GILEAD SCIENCES INC (US) | 2019-05-01 | — | — | EP | claimed |
| EP-3323414-A1 | INHIBITORS OF NEDD8-ACTIVATING ENZYME | Millennium Pharmaceuticals, Inc. (US) | 2018-05-23 | — | — | EP | claimed |
| US-9840568-B2 | Polymer and method for producing same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-12-12 | — | — | US | claimed |
| US-9507259-B2 | Photoresist composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-11-29 | — | — | US | claimed |
| US-9493469-B2 | Piperidine inhibitors of Janus kinase 3 | AUSPEX PHARMACEUTICALS, INC. (US) | 2016-11-15 | — | — | US | claimed |
| EP-2202577-B1 | Chemically amplified positive resist composition and resist patterning process | SHINETSU CHEMICAL CO (JP) | 2014-08-27 | — | — | EP | claimed |
| EP-2727915-A1 | Synthesis of deuterated catechols and benzo[d][1,3]dioxoles and derivatives thereof | Concert Pharmaceuticals Inc. (US) | 2014-05-07 | — | — | EP | claimed |
| US-20040033445-A1 | Method of forming a photoresist pattern and method for patterning a layer using a photoresist | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-19 | — | — | US | claimed |
| US-20040018442-A1 | Resist composition comprising photosensitive polymer having lactone in its backbone | YOON KWANG-SUB (KR) | 2004-01-29 | — | — | US | claimed |
| US-6642336-B1 | Ultraviolet radiation transparent; improved adhesion, contrast and dry etch resistance | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-11-04 | — | — | US | claimed |
| US-20030180661-A1 | Polymer having butadiene sulfone repeating unit and resist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-09-25 | — | — | US | claimed |
| US-6537727-B2 | Improved dry etching resistance, adhesiveness to underlying material layers, line edge roughness of line patterns, contrast characteristics | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-03-25 | — | — | US | claimed |
| US-20020160303-A1 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-10-31 | — | — | US | claimed |
| US-20020155379-A1 | Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting group | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-10-24 | — | — | US | claimed |
| US-20020042016-A1 | Resist composition comprising photosensitive polymer having loctone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-04-11 | — | — | US | claimed |
| EP-1078945-A2 | Polymer for use in a photoresist composition | SAMSUNG ELECTRONICS CO. LTD. (KR) | 2001-02-28 | — | — | EP | claimed |
| US-5837873-A | PROTECTED OXYDIAMINES | ABBOTT LABORATORIES (US) | 1998-11-17 | — | — | US | claimed |