Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A2 | O15244 | 2/20 | 0.62 |
| ▸ | SLC47A1 | Q96FL8 | 2/20 | 0.62 |
| ▸ | MAPT | P10636 | 1/20 | 0.59 |
| ▸ | GRIN2D | O15399 | 4/20 | 0.56 |
| ▸ | GRIN3B | O60391 | 4/20 | 0.56 |
| ▸ | GRIN1 | Q05586 | 4/20 | 0.56 |
| ▸ | GRIN2A | Q12879 | 4/20 | 0.56 |
| ▸ | GRIN2B | Q13224 | 4/20 | 0.56 |
| ▸ | GRIN2C | Q14957 | 4/20 | 0.56 |
| ▸ | GRIN3A | Q8TCU5 | 4/20 | 0.56 |
| ▸ | NPC1 | O15118 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.45 |
| ▸ | EPHX2 | P34913 | 5/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.38 |
| ▸ | STAT6 | P42226 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL138375 | 1.00 | SLC22A2 (0.62) | SLC22A2SLC47A1MAPTGRIN2DGRIN3B | |
| SCHEMBL31493460 | 0.87 | — | — | |
| SCHEMBL677940 | 0.81 | SLC22A2 (0.62) | SLC22A2SLC47A1MAPTGRIN2DGRIN3B | |
| Acrylic Acid SCHEMBL15051667 | 0.78 | NPC1 (0.44) | SLC22A2SLC47A1MAPTGRIN2DGRIN3B | |
| Methacrylic Acid SCHEMBL12803308 | 0.78 | ALDH1A1 (0.44) | SLC22A2SLC47A1MAPTGRIN2DGRIN3B | |
| SCHEMBL12578209 | 0.78 | SLC22A2 (0.46) | SLC22A2SLC47A1MAPTGRIN2DGRIN3B | |
| SCHEMBL14983838 | 0.78 | SLC22A2 (0.41) | SLC22A2SLC47A1MAPTGRIN2DGRIN3B | |
| SCHEMBL16448484 | 0.78 | SLC22A2 (0.41) | SLC22A2SLC47A1MAPTGRIN2DGRIN3B | |
| SCHEMBL7739624 | 0.77 | SLC22A2 (0.56) | SLC22A2SLC47A1MAPTGRIN2DGRIN3B | |
| Rimantadine SCHEMBL2981 | 0.77 | SLC22A2 (1.00) | SLC22A2SLC47A1MAPTGRIN2DGRIN3B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230408922-A1 | APPLICATION LIQUID FOR OPTICAL MEMBER, POLYMER, PHOTOSENSITIVE APPLICATION LIQUID, METHOD FOR PRODUCING CURED FILM, METHOD FOR PRODUCING PATTERNED CURED FILM, AND METHOD FOR PRODUCING POLYMER | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-12-21 | — | — | US | disclosed |
| US-20230333468-A1 | RESIN COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM, SUBSTRATE HAVING MULTILAYER FILM, METHOD FOR PRODUCING PATTERNED SUBSTRATE, PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN CURED FILM, METHOD FOR PRODUCING POLYMER, AND METHOD FOR PRODUCING RESIN COMPOSITION | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-10-19 | — | — | US | disclosed |
| US-20230322818-A1 | SILICON COMPOUND, REACTIVE MATERIAL, RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, METHOD OF MANUFACTURING CURED FILM, PATTERNED CURED FILM, AND METHOD OF MANUFACTURING PATTERNED CURED FILM | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-10-12 | — | — | US | disclosed |
| CN-116601210-A | Resin composition, cured film, method for producing cured film, substrate with multilayer film, method for producing substrate with pattern, photosensitive resin composition, method for producing pattern cured film, method for producing polymer, and method for producing resin composition | 中央硝子株式会社 | 2023-08-15 | — | — | CN | disclosed |
| CN-116601244-A | Coating liquid for optical member, polymer, cured film, photosensitive coating liquid, pattern cured film, optical member, solid-state imaging element, display device, silicone compound, stabilizer used in coating liquid, method for producing cured film, method for producing pattern cured film, and method for producing polymer | 中央硝子株式会社 | 2023-08-15 | — | — | CN | disclosed |
| CN-114585630-A | Silicon compound, reactive material, resin composition, photosensitive resin composition, cured film, method for producing cured film, patterned cured film, and method for producing patterned cured film | 中央硝子株式会社 | 2022-06-03 | — | — | CN | disclosed |
| US-20210395461-A1 | RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM, PATTERNED CURED FILM, METHOD FOR PRODUCING PATTERNED CURED FILM | CENTRAL GLASS COMPANY, LIMITED (JP) | 2021-12-23 | — | — | US | disclosed |
| CN-113166548-A | Resin composition, photosensitive resin composition, cured film, method for producing cured film, patterned cured film, and method for producing patterned cured film | 中央硝子株式会社 | 2021-07-23 | — | — | CN | disclosed |
| US-9951164-B2 | Non-ionic aryl ketone based polymeric photo-acid generators | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2018-04-24 | — | — | US | disclosed |
| US-20180044459-A1 | NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS | CENTRAL GLASS CO., LTD. (JP) | 2018-02-15 | — | — | US | disclosed |
| US-20120064459-A1 | Water Repellent Additive for Immersion Resist | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-03-15 | — | — | US | disclosed |
| US-20120040294-A1 | Top Coating Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-02-16 | — | — | US | disclosed |
| US-20110318542-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110177453-A1 | Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-07-21 | — | — | US | disclosed |
| US-20110098500-A1 | Polymerizable Fluorine-Containing Compound | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-04-28 | — | — | US | disclosed |
| EP-2309332-A1 | POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR Corporation (JP) | 2011-04-13 | — | — | EP | disclosed |
| US-7906269-B2 | Positive-type resist composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-03-15 | — | — | US | disclosed |
| US-7887990-B2 | Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-02-15 | — | — | US | disclosed |
| US-20090061353-A1 | Positive-Type Resist Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-03-05 | — | — | US | disclosed |
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-12-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180044459-A1 | NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS | PPARG, PPARA, PPARD | SLC22A2 3551/4885SLC47A1 4088/4885MAPT 2418/4885 |
| US-20110098500-A1 | Polymerizable Fluorine-Containing Compound | FRG1, AFF1, H1-2 | SLC22A2 2836/4885SLC47A1 4048/4885MAPT 1595/4885 |
| US-20110177453-A1 | Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same | WASF2, EEF2, IKZF2 | SLC22A2 1912/4885SLC47A1 263/4885MAPT 4365/4885 |
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | FRG1, FBXL19, FEM1B | SLC22A2 3113/4885SLC47A1 4005/4885MAPT 2426/4885 |
| US-20230322818-A1 | SILICON COMPOUND, REACTIVE MATERIAL, RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, METHOD OF MANUFACTURING CURED FILM, PATTERNED CURED FILM, AND METHOD OF MANUFACTURING PATTERNED CURED FILM | RAD51, RER1, RPS4Y1 | SLC22A2 3407/4885SLC47A1 4095/4885MAPT 2789/4885 |
| US-20110318542-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same | FRG1, AFF2, AFF1 | SLC22A2 1518/4885SLC47A1 3505/4885MAPT 2258/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.