Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A2 | O15244 | 2/20 | 0.62 |
| ▸ | SLC47A1 | Q96FL8 | 2/20 | 0.62 |
| ▸ | MAPT | P10636 | 1/20 | 0.59 |
| ▸ | NPC1 | O15118 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.45 |
| ▸ | GRIN2D | O15399 | 4/20 | 0.44 |
| ▸ | GRIN3B | O60391 | 4/20 | 0.44 |
| ▸ | GRIN1 | Q05586 | 4/20 | 0.44 |
| ▸ | GRIN2A | Q12879 | 4/20 | 0.44 |
| ▸ | GRIN2B | Q13224 | 4/20 | 0.44 |
| ▸ | GRIN2C | Q14957 | 4/20 | 0.44 |
| ▸ | GRIN3A | Q8TCU5 | 4/20 | 0.44 |
| ▸ | EPHX2 | P34913 | 5/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.38 |
| ▸ | STAT6 | P42226 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL455611 | 0.81 | SLC22A2 (0.62) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 | |
| SCHEMBL138375 | 0.81 | SLC22A2 (0.62) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 | |
| Rimantadine SCHEMBL20409367 | 0.77 | SLC22A2 (1.00) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 | |
| SCHEMBL237472 | 0.77 | SLC22A2 (0.56) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 | |
| SCHEMBL7739624 | 0.77 | SLC22A2 (0.56) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 | |
| SCHEMBL6655788 | 0.77 | SLC22A2 (0.56) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 | |
| SCHEMBL182779 | 0.77 | SLC22A2 (0.56) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 | |
| SCHEMBL7467574 | 0.77 | SLC22A2 (0.56) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 | |
| Rimantadine SCHEMBL2981 | 0.77 | SLC22A2 (1.00) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 | |
| Rimantadine SCHEMBL2982 | 0.77 | SLC22A2 (1.00) | SLC22A2SLC47A1MAPTNPC1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11681222-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2023-06-20 | — | — | US | disclosed |
| US-20220137508-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2022-05-05 | — | — | US | disclosed |
| US-20210278764-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2021-09-09 | — | — | US | disclosed |
| US-11036133-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2021-06-15 | — | — | US | disclosed |
| US-20200124961-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2020-04-23 | — | — | US | disclosed |
| US-10620534-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2020-04-14 | — | — | US | disclosed |
| US-20190278175-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2019-09-12 | — | — | US | disclosed |
| US-20190025695-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2019-01-24 | — | — | US | disclosed |
| US-10082733-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2018-09-25 | — | — | US | disclosed |
| EP-2325694-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2017-11-08 | — | — | EP | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| US-20060223001-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-05 | — | — | US | disclosed |
| EP-1679314-A1 | SILANE COMPOUND, POLYSILOXANE AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2006-07-12 | — | — | EP | disclosed |
| US-20060074139-A1 | Acrylic copolymer and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-04-06 | — | — | US | disclosed |
| EP-1602975-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-12-07 | — | — | EP | disclosed |
| EP-1586594-A1 | ACRYLIC COPOLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |
| US-20050171226-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2005-08-04 | — | — | US | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-6677419-B1 | REACTING STOICHIOMETRIC EXCESS OF UNSATURATED ALICYCLIC MONOMER WITH ANOTHER UNSATURATED MONOMER, HAVING LESS THAN TWO ELECTRON-WITHDRAWING GROUPS APPENDED TO UNSATURATION, IN PRESENCE OF FREE RADICAL INITIATOR | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-01-13 | — | — | US | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |