SCHEMBL13840903

SCHEMBL13840903

O=C(OCCSCCOc1ccccc1)C(F)(F)SOOO

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC1 Q13547 3/20 0.40
HDAC2 Q92769 3/20 0.40
PKM P14618 2/20 0.39
PARP10 Q53GL7 1/20 0.38
NPC1 O15118 2/20 0.36
RAB9A P51151 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
KDM4E B2RXH2 1/20 0.36
MEN1 O00255 1/20 0.36
ALDH1A1 P00352 1/20 0.36
HPGD P15428 1/20 0.36
NFKB1 P19838 1/20 0.36
NFKB2 Q00653 1/20 0.36
KMT2A Q03164 1/20 0.36
RELA Q04206 1/20 0.36
HSD17B10 Q99714 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
THRB P10828 1/20 0.36
TSHR P16473 1/20 0.35
PTGDR2 Q9Y5Y4 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13840908 0.87 PPARG (0.41) HDAC1NPC1RAB9ASMN1; SMN2KDM4E
SCHEMBL13840902 0.86 HDAC1 (0.44) HDAC1HDAC2PKMPARP10NPC1
SCHEMBL2603105 0.78 HCAR2 (0.43) NPC1RAB9ASMN1; SMN2ALDH1A1HPGD
SCHEMBL13842732 0.77 HDAC1 (0.42) HDAC1HDAC2PKMPARP10NPC1
SCHEMBL13840909 0.77 CNR2 (0.40) HDAC1HDAC2ALDH1A1HPGDPTGDR2
SCHEMBL2603109 0.77 PPARG (0.46) HDAC1NPC1RAB9ASMN1; SMN2KDM4E
SCHEMBL12972124 0.76 TDP1 (0.49) PKMNPC1RAB9ASMN1; SMN2ALDH1A1
SCHEMBL2602844 0.75 ALDH1A1 (0.36) NPC1RAB9AKDM4EMEN1ALDH1A1
SCHEMBL2603126 0.75 LMNA (0.50) NPC1RAB9ASMN1; SMN2KDM4EMEN1
SCHEMBL2603100 0.75 ATM (0.40) HDAC1HDAC2PARP10KDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7527910-B2 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-05-05 US disclosed
US-20070184382-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-08-09 US disclosed