SCHEMBL13840908

SCHEMBL13840908

O=C(OCCSCCOc1ccc2ccccc2c1)C(F)(F)SOOO

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPARG P37231 5/20 0.41
PPARD Q03181 3/20 0.41
PPARA Q07869 3/20 0.41
PTGDR2 Q9Y5Y4 1/20 0.40
KDM4E B2RXH2 3/20 0.39
ALDH1A1 P00352 2/20 0.39
PTPN7 P35236 1/20 0.39
TDP1 Q9NUW8 3/20 0.39
MAPK1 P28482 1/20 0.39
HDAC1 Q13547 1/20 0.39
RAB9A P51151 6/20 0.38
NPC1 O15118 5/20 0.38
MAPT P10636 3/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
GAA P10253 1/20 0.38
XBP1 P17861 1/20 0.38
HTT P42858 2/20 0.38
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
NCOA2 Q15596 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2603109 0.91 PPARG (0.46) PPARGPPARDPPARAPTGDR2KDM4E
SCHEMBL13840907 0.88 KDM4E (0.52) PPARGPPARDPPARAPTGDR2KDM4E
SCHEMBL13840903 0.87 HDAC1 (0.40) PTGDR2KDM4EALDH1A1TDP1HDAC1
SCHEMBL13840906 0.87 CNR2 (0.38) ALDH1A1HDAC1MAPTGAAHPGD
SCHEMBL13840909 0.84 CNR2 (0.40) PPARGPTGDR2ALDH1A1HDAC1MAPT
SCHEMBL14009406 0.81 PPARG (0.48) PPARGPPARDPPARAPTGDR2KDM4E
SCHEMBL13842650 0.80 PPARG (0.42) PPARGPPARDPPARAPTGDR2KDM4E
SCHEMBL13840939 0.80 PPARG (0.45) PPARGPPARDPPARAKDM4EALDH1A1
SCHEMBL13840926 0.80 PPARG (0.45) PPARGPPARDPPARAKDM4EALDH1A1
SCHEMBL2603104 0.79 CYP1A2 (0.41) PPARGPPARDPPARAHDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7527910-B2 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-05-05 US disclosed
US-20070184382-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-08-09 US disclosed