SCHEMBL13840907

SCHEMBL13840907

O=C(OCCOCCOc1ccc2ccccc2c1)C(F)(F)SOOO

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.52
TDP1 Q9NUW8 3/20 0.52
MAPK1 P28482 1/20 0.52
NPC1 O15118 3/20 0.47
MAPT P10636 3/20 0.47
RAB9A P51151 3/20 0.47
SMN1; SMN2 Q16637 2/20 0.47
PPARG P37231 5/20 0.44
PPARD Q03181 3/20 0.44
PPARA Q07869 3/20 0.44
ALDH1A1 P00352 2/20 0.40
PTPN7 P35236 1/20 0.40
HDAC1 Q13547 1/20 0.39
CPT2 P23786 1/20 0.39
CPT1A P50416 1/20 0.39
CPT1B Q92523 1/20 0.39
GAA P10253 1/20 0.39
XBP1 P17861 1/20 0.39
HTT P42858 2/20 0.37
MEN1 O00255 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2603109 0.96 PPARG (0.46) KDM4ETDP1MAPK1NPC1MAPT
SCHEMBL13840908 0.88 PPARG (0.41) KDM4ETDP1MAPK1NPC1MAPT
SCHEMBL14009406 0.87 PPARG (0.48) KDM4ETDP1MAPK1NPC1MAPT
SCHEMBL13840902 0.87 HDAC1 (0.44) KDM4ENPC1RAB9ASMN1; SMN2ALDH1A1
SCHEMBL13840926 0.85 PPARG (0.45) KDM4ETDP1MAPK1NPC1MAPT
SCHEMBL13840939 0.85 PPARG (0.45) KDM4ETDP1MAPK1NPC1MAPT
SCHEMBL2603120 0.84 PPARG (0.35) KDM4ETDP1MAPK1NPC1MAPT
SCHEMBL2603104 0.82 CYP1A2 (0.41) PPARGPPARDPPARAHDAC1
SCHEMBL13840909 0.80 CNR2 (0.40) MAPTPPARGALDH1A1HDAC1GAA
SCHEMBL2602846 0.79 ALDH1A1 (0.41) KDM4ETDP1NPC1MAPTRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7527910-B2 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-05-05 US disclosed
US-20070184382-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-08-09 US disclosed