SCHEMBL13840939

SCHEMBL13840939

O=C(OCCOc1ccc2ccccc2c1)C(SOOO)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPARG P37231 4/20 0.45
PPARD Q03181 3/20 0.45
PPARA Q07869 3/20 0.45
KDM4E B2RXH2 3/20 0.43
TDP1 Q9NUW8 3/20 0.43
MAPK1 P28482 1/20 0.43
ALDH1A1 P00352 2/20 0.43
PTPN7 P35236 1/20 0.41
HDAC1 Q13547 1/20 0.40
CPT2 P23786 1/20 0.40
CPT1A P50416 1/20 0.40
CPT1B Q92523 1/20 0.40
RAB9A P51151 5/20 0.39
NPC1 O15118 4/20 0.39
MAPT P10636 3/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
GAA P10253 1/20 0.39
XBP1 P17861 1/20 0.39
HTT P42858 2/20 0.38
MEN1 O00255 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13840926 0.88 PPARG (0.45) PPARGPPARDPPARAKDM4ETDP1
SCHEMBL2603109 0.88 PPARG (0.46) PPARGPPARDPPARAKDM4ETDP1
SCHEMBL13840945 0.87 CA1 (0.35) PPARGPPARDPPARAKDM4ETDP1
SCHEMBL13840907 0.85 KDM4E (0.52) PPARGPPARDPPARAKDM4ETDP1
SCHEMBL13840940 0.81 ALDH1A1 (0.43) KDM4ETDP1ALDH1A1RAB9ANPC1
SCHEMBL14009406 0.81 PPARG (0.48) PPARGPPARDPPARAKDM4ETDP1
SCHEMBL13840908 0.80 PPARG (0.41) PPARGPPARDPPARAKDM4ETDP1
SCHEMBL13840935 0.78 HCAR2 (0.41) TDP1MAPK1ALDH1A1RAB9ANPC1
SCHEMBL12128705 0.77 PPARG (0.55) PPARGPPARDPPARAKDM4ETDP1
SCHEMBL13840938 0.77 TRPV1 (0.39) KDM4ETDP1ALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7527910-B2 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-05-05 US disclosed
US-20070184382-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-08-09 US disclosed