SCHEMBL13840910

SCHEMBL13840910

O=C(OCCSc1cccc2ccccc12)C(F)(F)SOOO

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC3 O15379 1/20 0.35
HDAC4 P56524 1/20 0.35
HDAC1 Q13547 1/20 0.35
HDAC7 Q8WUI4 1/20 0.35
HDAC2 Q92769 1/20 0.35
HDAC10 Q969S8 1/20 0.35
HDAC11 Q96DB2 1/20 0.35
HDAC8 Q9BY41 1/20 0.35
HDAC6 Q9UBN7 1/20 0.35
HDAC9 Q9UKV0 1/20 0.35
HDAC5 Q9UQL6 1/20 0.35
PTGDR2 Q9Y5Y4 1/20 0.34
HPGD P15428 6/20 0.34
ALDH1A1 P00352 5/20 0.34
MEN1 O00255 3/20 0.34
KMT2A Q03164 3/20 0.34
POLB P06746 3/20 0.34
TDP1 Q9NUW8 2/20 0.34
NPC1 O15118 1/20 0.34
MAPT P10636 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13840913 0.87
SCHEMBL13840909 0.81 CNR2 (0.40) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL2603108 0.81 TRPV1 (0.41) ALDH1A1MEN1KMT2ATDP1KDM4E
SCHEMBL2603110 0.81 ALDH1A1 (0.45) PTGDR2HPGDALDH1A1MEN1KMT2A
SCHEMBL13840914 0.79 HSD17B1 (0.35)
SCHEMBL13842645 0.79 HDAC3 (0.36) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL2603107 0.78 MEN1 (0.43) HPGDMEN1KMT2ATDP1LMNA
SCHEMBL13840879 0.77 KDM4E (0.46) HPGDALDH1A1MEN1KMT2ATDP1
SCHEMBL13840906 0.75 CNR2 (0.38) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL2603116 0.74 PPARG (0.43) HPGDALDH1A1MEN1KMT2ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7527910-B2 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-05-05 US disclosed
US-20070184382-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-08-09 US disclosed