SCHEMBL13840906

SCHEMBL13840906

O=C(OCCSCCSc1ccc2ccccc2c1)C(F)(F)SOOO

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CNR2 P34972 2/20 0.38
ANPEP P15144 1/20 0.37
MAPT P10636 5/20 0.33
HDAC3 O15379 1/20 0.33
HDAC4 P56524 1/20 0.33
HDAC1 Q13547 1/20 0.33
HDAC7 Q8WUI4 1/20 0.33
HDAC2 Q92769 1/20 0.33
HDAC10 Q969S8 1/20 0.33
HDAC11 Q96DB2 1/20 0.33
HDAC8 Q9BY41 1/20 0.33
HDAC6 Q9UBN7 1/20 0.33
HDAC9 Q9UKV0 1/20 0.33
HDAC5 Q9UQL6 1/20 0.33
LMNA P02545 2/20 0.33
STAT3 P40763 1/20 0.33
GAA P10253 2/20 0.32
ALDH1A1 P00352 4/20 0.32
BACE1 P56817 2/20 0.32
CAPN1 P07384 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13840909 0.93 CNR2 (0.40) CNR2ANPEPMAPTHDAC3HDAC4
SCHEMBL13840908 0.87 PPARG (0.41) MAPTHDAC1GAAALDH1A1HPGD
SCHEMBL13840903 0.80 HDAC1 (0.40) HDAC1HDAC2ALDH1A1HPGD
SCHEMBL13842648 0.80 CNR2 (0.41) CNR2ANPEPMAPTHDAC3HDAC4
SCHEMBL2603109 0.79 PPARG (0.46) MAPTHDAC1GAAALDH1A1MCL1
SCHEMBL2603104 0.79 CYP1A2 (0.41) HDAC1HDAC8
SCHEMBL13840914 0.79 HSD17B1 (0.35)
SCHEMBL13840907 0.76 KDM4E (0.52) MAPTHDAC1GAAALDH1A1MCL1
SCHEMBL2603103 0.76 RAB9A (0.40) MAPTGAA
SCHEMBL13840910 0.75 HDAC3 (0.35) MAPTHDAC3HDAC4HDAC1HDAC7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7527910-B2 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-05-05 US disclosed
US-20070184382-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-08-09 US disclosed