SCHEMBL13840920

SCHEMBL13840920

O=C(OCc1ccccc1)C(F)(SOOO)C(F)(F)F

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.45
MEN1 O00255 1/20 0.45
PTPN1 P18031 4/20 0.43
PTPRC P08575 1/20 0.43
ALDH1A1 P00352 4/20 0.42
TDP1 Q9NUW8 2/20 0.41
MAPK1 P28482 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
SLC6A2 P23975 1/20 0.41
SLC6A3 Q01959 1/20 0.41
LMNA P02545 2/20 0.40
HCAR2 Q8TDS4 1/20 0.39
CA12 O43570 1/20 0.38
AKR1B10 O60218 1/20 0.38
AKR1B1 P15121 1/20 0.38
CA4 P22748 1/20 0.38
CA6 P23280 1/20 0.38
CA5A P35218 1/20 0.38
CA7 P43166 1/20 0.38
CA9 Q16790 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13840922 0.86 AKR1B10 (0.43) KMT2AMEN1ALDH1A1TDP1MAPK1
SCHEMBL13840933 0.86 KMT2A (0.45) KMT2AMEN1PTPN1PTPRCALDH1A1
SCHEMBL2603101 0.85 PTPN1 (0.45) KMT2AMEN1PTPN1PTPRCALDH1A1
SCHEMBL13840921 0.78 MAOB (0.39) ALDH1A1TDP1L3MBTL1
SCHEMBL2602863 0.77 ALDH1A1 (0.45) KMT2AMEN1PTPN1PTPRCALDH1A1
SCHEMBL14009407 0.76 ALDH1A1 (0.47) KMT2AMEN1PTPN1PTPRCALDH1A1
SCHEMBL19695641 0.75 KMT2A (0.54) KMT2AMEN1PTPN1PTPRCALDH1A1
SCHEMBL3296385 0.74 ALDH1A1 (0.57) KMT2AMEN1PTPN1PTPRCALDH1A1
SCHEMBL24142683 0.73 KMT2A (0.56) KMT2AMEN1PTPN1PTPRCALDH1A1
SCHEMBL12854419 0.73 POLB (0.35) KMT2AMEN1ALDH1A1L3MBTL1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7527910-B2 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-05-05 US disclosed
US-20070184382-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-08-09 US disclosed