SCHEMBL13840933

SCHEMBL13840933

O=C(OCc1ccccc1)C(SOOO)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.45

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.45
MEN1 O00255 1/20 0.45
PTPN1 P18031 4/20 0.43
PTPRC P08575 1/20 0.43
ALDH1A1 P00352 4/20 0.42
TDP1 Q9NUW8 2/20 0.41
MAPK1 P28482 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
SLC6A2 P23975 1/20 0.41
SLC6A3 Q01959 1/20 0.41
LMNA P02545 3/20 0.39
HCAR2 Q8TDS4 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13840935 0.86 HCAR2 (0.41) ALDH1A1TDP1MAPK1L3MBTL1LMNA
SCHEMBL13840920 0.86 KMT2A (0.45) KMT2AMEN1PTPN1PTPRCALDH1A1
SCHEMBL2603101 0.85 PTPN1 (0.45) KMT2AMEN1PTPN1PTPRCALDH1A1
SCHEMBL13840936 0.79 MEN1 (0.41) KMT2AMEN1TDP1LMNASMN1; SMN2
SCHEMBL2602863 0.77 ALDH1A1 (0.45) KMT2AMEN1PTPN1PTPRCALDH1A1
SCHEMBL14009407 0.76 ALDH1A1 (0.47) KMT2AMEN1PTPN1PTPRCALDH1A1
SCHEMBL19695641 0.75 KMT2A (0.54) KMT2AMEN1PTPN1PTPRCALDH1A1
SCHEMBL3296385 0.74 ALDH1A1 (0.57) KMT2AMEN1PTPN1PTPRCALDH1A1
SCHEMBL24142683 0.73 KMT2A (0.56) KMT2AMEN1PTPN1PTPRCALDH1A1
SCHEMBL12854424 0.73 POLB (0.35) KMT2AMEN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7527910-B2 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-05-05 US disclosed
US-20070184382-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-08-09 US disclosed