SCHEMBL13840936

SCHEMBL13840936

O=C(OCc1cccc2ccccc12)C(SOOO)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.41
KMT2A Q03164 4/20 0.41
PARP10 Q53GL7 2/20 0.41
EPHX1 P07099 1/20 0.41
TDP1 Q9NUW8 1/20 0.38
SLC1A3 P43003 1/20 0.38
SLC1A2 P43004 1/20 0.38
SLC1A1 P43005 1/20 0.38
CYP1A2 P05177 2/20 0.37
ATM Q13315 1/20 0.37
FFAR1 O14842 1/20 0.37
AKR1B1 P15121 1/20 0.37
TRPV1 Q8NER1 1/20 0.36
PARP15 Q460N3 1/20 0.36
KDM4E B2RXH2 1/20 0.36
LMNA P02545 1/20 0.36
HPGD P15428 1/20 0.36
PTGER4 P35408 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
SIRT5 Q9NXA8 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13840938 0.88 TRPV1 (0.39) MEN1KMT2APARP10TDP1CYP1A2
SCHEMBL13840924 0.88 KMT2A (0.41) MEN1KMT2APARP10EPHX1TDP1
SCHEMBL2603107 0.88 MEN1 (0.43) MEN1KMT2APARP10EPHX1TDP1
SCHEMBL13840940 0.81 ALDH1A1 (0.43) MEN1KMT2ATDP1ATMKDM4E
SCHEMBL14009416 0.80 MEN1 (0.45) MEN1KMT2APARP10EPHX1TDP1
SCHEMBL13840933 0.79 KMT2A (0.45) MEN1KMT2ATDP1LMNASMN1; SMN2
SCHEMBL2603116 0.79 PPARG (0.43) MEN1KMT2APARP10EPHX1TDP1
SCHEMBL13840937 0.79 ALDH1A1 (0.43) MEN1KMT2ATDP1KDM4EHPGD
SCHEMBL24142223 0.78 EPHX1 (0.47) MEN1KMT2APARP10EPHX1TDP1
SCHEMBL2603112 0.77 KDM4E (0.37) MEN1KMT2APARP10EPHX1FFAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7527910-B2 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-05-05 US disclosed
US-20070184382-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-08-09 US disclosed