SCHEMBL13840938

SCHEMBL13840938

O=C(OCCc1cccc2ccccc12)C(SOOO)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TRPV1 Q8NER1 1/20 0.39
CDYL Q9Y232 1/20 0.39
CHRM5 P08912 1/20 0.38
CHRM1 P11229 1/20 0.38
MTNR1A P48039 2/20 0.38
KDM4E B2RXH2 2/20 0.37
TDP1 Q9NUW8 2/20 0.37
MCL1 Q07820 2/20 0.36
FFAR4 Q5NUL3 1/20 0.36
CYP1A2 P05177 1/20 0.36
CTNNB1 P35222 1/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
PARP10 Q53GL7 1/20 0.35
ALDH1A1 P00352 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13840925 0.88 TRPV1 (0.39) TRPV1CDYLCHRM5CHRM1MTNR1A
SCHEMBL2603108 0.88 TRPV1 (0.41) TRPV1CDYLCHRM5CHRM1MTNR1A
SCHEMBL13840936 0.88 MEN1 (0.41) TRPV1MTNR1AKDM4ETDP1CYP1A2
SCHEMBL13840940 0.86 ALDH1A1 (0.43) KDM4ETDP1MCL1MEN1KMT2A
SCHEMBL2602896 0.81 CDYL (0.42) TRPV1CDYLCHRM5CHRM1MTNR1A
SCHEMBL14009466 0.81 TRPV1 (0.42) TRPV1CDYLCHRM5CHRM1MTNR1A
SCHEMBL13840935 0.80 HCAR2 (0.41) TDP1ALDH1A1
SCHEMBL12128700 0.77 CDYL (0.48) TRPV1CDYLCHRM5CHRM1MTNR1A
SCHEMBL13840939 0.77 PPARG (0.45) KDM4ETDP1MCL1MEN1KMT2A
SCHEMBL13840937 0.77 ALDH1A1 (0.43) KDM4ETDP1MEN1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7527910-B2 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-05-05 US disclosed
US-20070184382-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-08-09 US disclosed