Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | PGK1 | P00558 | 1/20 | 0.30 |
| ▸ | PGK2 | P07205 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9418913 | 0.79 | THRB (0.35) | THRB | |
| SCHEMBL9293043 | 0.76 | LMNA (0.35) | THRB | |
| SCHEMBL8612528 | 0.74 | THRB (0.32) | THRB | |
| SCHEMBL197133 | 0.73 | — | — | |
| SCHEMBL14517386 | 0.73 | THRB (0.32) | THRB | |
| SCHEMBL11102573 | 0.73 | LMNA (0.40) | THRB | |
| SCHEMBL10202619 | 0.72 | THRB (0.35) | THRB | |
| SCHEMBL14444154 | 0.72 | THRB (0.35) | THRB | |
| SCHEMBL10049924 | 0.72 | THRB (0.35) | THRB | |
| SCHEMBL16017651 | 0.72 | PGK1 (0.33) | PGK1PGK2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7531289-B2 | Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-05-12 | — | — | US | disclosed |
| US-7202318-B2 | Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-04-10 | — | — | US | disclosed |
| US-7202318-B2 | Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-04-10 | — | — | US | disclosed |