Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MDH1 | P40925 | 1/20 | 0.40 |
| ▸ | MDH2 | P40926 | 1/20 | 0.40 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.35 |
| ▸ | DPP8 | Q6V1X1 | 3/20 | 0.33 |
| ▸ | DPP9 | Q86TI2 | 3/20 | 0.33 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.33 |
| ▸ | DPP4 | P27487 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | CNR1 | P21554 | 2/20 | 0.31 |
| ▸ | CNR2 | P34972 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11966898 | 0.92 | HSD11B1 (0.38) | MDH1MDH2HSD11B1DPP8DPP9 | |
| SCHEMBL11985998 | 0.91 | MDH1 (0.35) | MDH1MDH2HSD11B1DPP8DPP9 | |
| SCHEMBL11911041 | 0.89 | MDH1 (0.31) | MDH1MDH2 | |
| SCHEMBL18308571 | 0.89 | MDH1 (0.34) | MDH1MDH2HSD11B1DPP8DPP9 | |
| SCHEMBL12304939 | 0.89 | MDH1 (0.34) | MDH1MDH2HSD11B1DPP8DPP9 | |
| SCHEMBL132001 | 0.89 | MDH1 (0.34) | MDH1MDH2HSD11B1DPP8DPP9 | |
| SCHEMBL13979870 | 0.88 | HSD11B1 (0.36) | MDH1MDH2HSD11B1DPP8DPP9 | |
| SCHEMBL107281 | 0.88 | HSD11B1 (0.36) | MDH1MDH2HSD11B1DPP8DPP9 | |
| SCHEMBL12019765 | 0.87 | HSD11B1 (0.35) | MDH1MDH2HSD11B1DPP8DPP9 | |
| SCHEMBL14556923 | 0.87 | MDH1 (0.33) | MDH1MDH2HSD11B1DPP8DPP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2009067354-A1 | PHOTORESIST COMPOSITIONS AND PROCESS FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER PHOTORESIST SYSTEMS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-05-28 | — | — | WO | disclosed |