SCHEMBL13849564

SCHEMBL13849564

O=C(OC1CCCCC1)C1C2CCC(O2)C1C(=O)OC(CF)C(F)F

nearest known ligand 0.34

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
PPM1B O75688 3/20 0.34
PTPN1 P18031 3/20 0.34
PPP1CC P36873 3/20 0.34
FABP7 O15540 1/20 0.33
FABP5 Q01469 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.32
LMNA P02545 2/20 0.31
PPP1CA P62136 1/20 0.31
EPHX1 P07099 1/20 0.31
KDM4E B2RXH2 1/20 0.30
GMNN O75496 1/20 0.30
PMP22 Q01453 1/20 0.30
TFPI2 P48307 1/20 0.30
TP53 P04637 1/20 0.30
TSHR P16473 1/20 0.30
NFKB1 P19838 1/20 0.30
THPO P40225 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13849560 0.84 FABP7 (0.35) FABP7FABP5L3MBTL1EPHX1
SCHEMBL13849601 0.82 EPHX1 (0.34) FABP7FABP5L3MBTL1EPHX1TP53
SCHEMBL13849561 0.82 PPM1B (0.51) PPM1BPTPN1PPP1CCLMNAPPP1CA
SCHEMBL13849562 0.81 PPM1B (0.54) PPM1BPTPN1PPP1CC
SCHEMBL11991785 0.81 PPM1B (0.35) PPM1BPTPN1PPP1CCFABP7FABP5
SCHEMBL13849565 0.74 PPM1B (0.32) PPM1BPTPN1PPP1CC
SCHEMBL11991272 0.72 FABP7 (0.32) PPM1BPTPN1PPP1CCFABP7FABP5
SCHEMBL13338790 0.70 PPM1B (0.41) PPM1BPTPN1PPP1CCFABP7FABP5
SCHEMBL10239141 0.68 PPM1B (0.41) PPM1BPTPN1PPP1CCFABP7FABP5
SCHEMBL13849575 0.67 MEN1 (0.43) FABP7FABP5LMNAKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7527912-B2 Photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-05-05 US disclosed
US-20080085469-A1 Novel photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-04-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080085469-A1 Novel photoacid generators, resist compositions, and patterning process RER1, SCO2, ASIC3 PPM1B 3930/4885PTPN1 3359/4885PPP1CC 3723/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.