SCHEMBL13867207

SCHEMBL13867207

C=C(C)C1C2CC(C(C)C2C)C1C(=O)O

nearest known ligand 0.39

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ POLB P06746 4/20 0.39
▸ TDP1 Q9NUW8 3/20 0.39
▸ GRM2 Q14416 4/20 0.38
▸ GRM3 Q14832 4/20 0.38
▸ LMNA P02545 2/20 0.34
▸ HTT P42858 1/20 0.34
▸ PPP5C P53041 1/20 0.33
▸ CTDSP1 Q9GZU7 1/20 0.33
▸ ALDH1A1 P00352 1/20 0.32
▸ APEX1 P27695 1/20 0.32
▸ MAPK1 P28482 1/20 0.32
▸ GRM8 O00222 1/20 0.32
▸ GRM4 Q14833 1/20 0.32
▸ CES2 O00748 1/20 0.31
▸ SLC1A2 P43004 1/20 0.31
▸ SLC1A1 P43005 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12763440 0.87 POLB (0.48) POLBTDP1GRM2GRM3LMNA
SCHEMBL13867214 0.83 GRM2 (0.44) POLBTDP1GRM2GRM3LMNA
SCHEMBL13784510 0.76 POLB (0.43) POLBTDP1GRM2GRM3LMNA
SCHEMBL12927846 0.73 PPM1B (0.47) POLBTDP1GRM2GRM3HTT
SCHEMBL432536 0.71 POLB (0.57) POLBTDP1GRM2GRM3LMNA
SCHEMBL29143206 0.70 POLB (0.41) POLBTDP1GRM2GRM3LMNA
SCHEMBL2601860 0.70 POLB (0.41) POLBTDP1GRM2GRM3LMNA
SCHEMBL111757 0.69 POLB (0.38) POLBTDP1GRM2GRM3LMNA
SCHEMBL13243326 0.69 POLB (0.34) POLBTDP1GRM2GRM3
SCHEMBL18177762 0.69 POLB (0.38) POLBTDP1GRM2GRM3LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7521172-B2 Topcoat material and use thereof in immersion lithography processes INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-04-21 — — US disclosed
US-20070254237-A1 TOPCOAT MATERIAL AND USE THEREOF IN IMMERSION LITHOGRAPHY PROCESSES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-11-01 — — US disclosed
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