SCHEMBL13867214

SCHEMBL13867214

CC(=O)C1C2CC(C(C)C2C)C1C(=O)O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ GRM2 Q14416 4/20 0.44
▸ GRM3 Q14832 4/20 0.44
▸ POLB P06746 4/20 0.41
▸ TDP1 Q9NUW8 3/20 0.41
▸ GRM8 O00222 1/20 0.37
▸ GRM4 Q14833 1/20 0.37
▸ LMNA P02545 3/20 0.36
▸ HTT P42858 1/20 0.36
▸ CTDSP1 Q9GZU7 1/20 0.36
▸ PPP5C P53041 1/20 0.35
▸ APEX1 P27695 1/20 0.34
▸ ALDH1A1 P00352 1/20 0.34
▸ MAPK1 P28482 1/20 0.33
▸ SLC1A2 P43004 1/20 0.32
▸ SLC1A1 P43005 1/20 0.32
▸ CA1 P00915 1/20 0.30
▸ CA2 P00918 1/20 0.30
▸ KDM4E B2RXH2 1/20 0.30
▸ GMNN O75496 1/20 0.30
▸ PMP22 Q01453 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12763440 0.91 POLB (0.48) GRM2GRM3POLBTDP1GRM8
SCHEMBL13867207 0.83 POLB (0.39) GRM2GRM3POLBTDP1GRM8
SCHEMBL13784510 0.79 POLB (0.43) GRM2GRM3POLBTDP1GRM8
SCHEMBL12927846 0.77 PPM1B (0.47) GRM2GRM3POLBTDP1HTT
SCHEMBL432536 0.74 POLB (0.57) GRM2GRM3POLBTDP1GRM8
SCHEMBL2601860 0.73 POLB (0.41) GRM2GRM3POLBTDP1LMNA
SCHEMBL29143206 0.73 POLB (0.41) GRM2GRM3POLBTDP1LMNA
SCHEMBL13243326 0.72 POLB (0.34) GRM2GRM3POLBTDP1
SCHEMBL111757 0.72 POLB (0.38) GRM2GRM3POLBTDP1LMNA
SCHEMBL18177762 0.72 POLB (0.38) GRM2GRM3POLBTDP1GRM8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7521172-B2 Topcoat material and use thereof in immersion lithography processes INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-04-21 — — US disclosed
US-20070254237-A1 TOPCOAT MATERIAL AND USE THEREOF IN IMMERSION LITHOGRAPHY PROCESSES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-11-01 — — US disclosed
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