SCHEMBL13868094

SCHEMBL13868094

CCOC(=O)c1cc(C(=O)OCC)c(C(=O)Nc2ccc(S(=O)(=O)c3ccc(C)cc3)cc2)cc1C(=O)NC

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 5/20 0.51
▸ ALDH1A1 P00352 3/20 0.51
▸ CA2 P00918 1/20 0.49
▸ CA9 Q16790 1/20 0.49
▸ PKM P14618 1/20 0.49
▸ KMT2A Q03164 4/20 0.47
▸ MEN1 O00255 3/20 0.47
▸ SMN1; SMN2 Q16637 2/20 0.47
▸ RECQL P46063 1/20 0.47
▸ HSD17B10 Q99714 1/20 0.47
▸ KDM4E B2RXH2 3/20 0.46
▸ TSHR P16473 1/20 0.46
▸ L3MBTL1 Q9Y468 1/20 0.46
▸ MAPT P10636 3/20 0.46
▸ TP53 P04637 2/20 0.46
▸ GAA P10253 2/20 0.44
▸ NPC1 O15118 1/20 0.44
▸ RAB9A P51151 1/20 0.44
▸ BCL2L1 Q07817 1/20 0.44
▸ ATM Q13315 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13868093 1.00 LMNA (0.51) LMNAALDH1A1CA2CA9PKM
SCHEMBL13868092 0.96 LMNA (0.50) LMNAALDH1A1CA2CA9PKM
SCHEMBL13868090 0.96 LMNA (0.50) LMNAALDH1A1CA2CA9PKM
SCHEMBL13868089 0.84 ALDH1A1 (0.52) LMNAALDH1A1PKMKMT2AMEN1
SCHEMBL13868091 0.84 ALDH1A1 (0.52) LMNAALDH1A1PKMKMT2AMEN1
SCHEMBL16926205 0.84 ALDH1A1 (0.59) LMNAALDH1A1PKMKMT2AMEN1
SCHEMBL13932543 0.83 PNLIP (0.50) LMNAALDH1A1KMT2AMEN1SMN1; SMN2
SCHEMBL14005762 0.76 ALDH1A1 (0.56) LMNAALDH1A1PKMKMT2AMEN1
SCHEMBL8912985 0.76 SMN1; SMN2 (0.53) LMNAALDH1A1PKMKMT2AMEN1
SCHEMBL12084276 0.74 NPC1 (0.67) LMNAALDH1A1CA2PKMKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7514200-B2 Hard mask composition for lithography process HYNIX SEMICONDUCTOR INC. (KR) 2009-04-07 — — US disclosed
US-20080138745-A1 POLYMER FOR HARD MASK OF SEMICONDUCTOR DEVICE AND COMPOSITION CONTAINING THE SAME HYNIX SEMICONDUCTOR INC. (KR) 2008-06-12 — — US disclosed
US-20070154839-A1 Hard mask composition for lithography process HYNIX SEMICONDUCTOR INC. (KR) 2007-07-05 — — US disclosed
US-20070142617-A1 Polymer for hard mask of semiconductor device and composition containing the same HYNIX SEMICONDUCTOR INC. (KR) 2007-06-21 — — US disclosed
Send feedback