Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Monoethanolamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Monoethanolamine SCHEMBL8402255 | 1.00 | ALDH1A1 (0.50) | — | |
| Ethylenediamine SCHEMBL3912160 | 0.88 | ALDH1A1 (0.37) | — | |
| SCHEMBL15225 | 0.87 | — | — | |
| SCHEMBL6247615 | 0.87 | CARM1 (0.37) | — | |
| SCHEMBL16561236 | 0.86 | CA12 (0.53) | — | |
| SCHEMBL10976565 | 0.84 | CA12 (0.50) | — | |
| Water SCHEMBL2274846 | 0.83 | PRMT3 (0.35) | — | |
| Ammonia Solution, Strong SCHEMBL10620957 | 0.83 | — | — | |
| Bromide SCHEMBL437925 | 0.83 | — | — | |
| SCHEMBL29936682 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120010118-A1 | LIQUID DETERGENT COMPOSITION | KAO CORPORATION (JP) | 2012-01-12 | — | — | US | disclosed |
| EP-1446460-A4 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECH MATERIALS (US) | 2009-08-19 | — | — | EP | disclosed |
| EP-1446460-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2004-08-18 | — | — | EP | disclosed |
| WO-2003035797-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2003-05-01 | — | — | WO | disclosed |