SCHEMBL13898650

SCHEMBL13898650

CCC(C)c1ccc(O)c(C(=O)Oc2cc(C(F)(F)F)cc(C(F)(F)F)c2)c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.42
GAA P10253 2/20 0.42
USP2 O75604 1/20 0.42
PKM P14618 1/20 0.42
HPGD P15428 1/20 0.42
ALOX15 P16050 1/20 0.42
HSD17B10 Q99714 1/20 0.42
P2RX1 P51575 7/20 0.40
TMPRSS4 Q9NRS4 5/20 0.40
HSP90AA1 P07900 1/20 0.38
HSP90AB1 P08238 1/20 0.38
AKR1C3 P42330 2/20 0.37
AKR1C2 P52895 2/20 0.37
HDAC4 P56524 1/20 0.37
HDAC2 Q92769 1/20 0.37
HDAC8 Q9BY41 1/20 0.37
TSHR P16473 1/20 0.36
FAAH O00519 1/20 0.36
SCN9A Q15858 3/20 0.36
LMNA P02545 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13898548 0.83 ALDH1A1 (0.46) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL683263 0.81 HPGD (0.53) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL13898647 0.79 ALDH1A1 (0.45) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL683267 0.76 CA12 (0.56) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL14924829 0.76 PRSS1 (0.40) ALDH1A1AKR1C3AKR1C2TSHRFAAH
SCHEMBL13898638 0.76 ALDH1A1 (0.49) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL13898423 0.75 CA12 (0.62) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL14962508 0.74 ALDH1A1 (0.42) ALDH1A1HSP90AA1AKR1C3AKR1C2TSHR
SCHEMBL5885088 0.72 ALDH1A1 (0.57) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL9908617 0.72 ALDH1A1 (0.57) ALDH1A1GAAUSP2PKMHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7498116-B2 Resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2009-03-03 US disclosed
US-7498116-B2 Resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2009-03-03 US disclosed
US-20080241750-A1 RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241750-A1 RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed