SCHEMBL14924829

SCHEMBL14924829

CCC(C)c1ccc(C(=O)Oc2cc(C)cc(C(F)(F)F)c2)cc1

nearest known ligand 0.40

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
PRSS1 P07477 3/20 0.40
ACR P10323 3/20 0.40
ALDH1A1 P00352 3/20 0.39
TSHR P16473 2/20 0.39
KMT2A Q03164 3/20 0.37
MEN1 O00255 2/20 0.37
TDP1 Q9NUW8 1/20 0.37
CYP2C9 P11712 2/20 0.36
CYP1A2 P05177 2/20 0.36
FAAH O00519 1/20 0.36
CYP3A4 P08684 3/20 0.36
CYP2C19 P33261 2/20 0.36
MAPK1 P28482 1/20 0.36
AKR1C3 P42330 3/20 0.35
AKR1C2 P52895 3/20 0.35
UTS2R Q9UKP6 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14962508 0.83 ALDH1A1 (0.42) PRSS1ACRALDH1A1TSHRKMT2A
SCHEMBL14962497 0.83 ALDH1A1 (0.42) PRSS1ACRALDH1A1TSHRKMT2A
SCHEMBL14962498 0.77 ALDH1A1 (0.44) PRSS1ACRALDH1A1TSHRKMT2A
SCHEMBL13898153 0.77 KMT2A (0.40) PRSS1ACRALDH1A1TSHRKMT2A
SCHEMBL14461699 0.77 ALDH1A1 (0.50) PRSS1ACRALDH1A1TSHRKMT2A
SCHEMBL14924831 0.77 FFAR1 (0.41)
SCHEMBL13898650 0.76 ALDH1A1 (0.42) ALDH1A1TSHRFAAHAKR1C3AKR1C2
SCHEMBL14866980 0.75 MAPT (0.60) PRSS1ACRALDH1A1TSHRKMT2A
SCHEMBL1789851 0.74 ALDH1A1 (0.53) PRSS1ACRALDH1A1TSHRKMT2A
SCHEMBL18356009 0.73 ALDH1A1 (0.40) ALDH1A1TSHRKMT2AMEN1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9034558-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern FUJIFILM CORPORATION (JP) 2015-05-19 US disclosed
US-20130115557-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2013-05-09 US disclosed