SCHEMBL13898733

SCHEMBL13898733

CCC(C)(Br)c1cccc(C(=O)O)c1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 1/20 0.51
POLB P06746 1/20 0.51
CYP2C9 P11712 1/20 0.51
RAB9A P51151 1/20 0.51
RXRA P19793 2/20 0.49
RXRB P28702 2/20 0.49
KIF11 P52732 1/20 0.47
ACHE P22303 3/20 0.46
SRD5A2 P31213 1/20 0.45
KMT2A Q03164 1/20 0.45
NR4A1 P22736 1/20 0.44
NR4A2 P43354 1/20 0.44
NR4A3 Q92570 1/20 0.44
NR1H4 Q96RI1 1/20 0.44
CA12 O43570 1/20 0.44
CA1 P00915 1/20 0.44
CA2 P00918 1/20 0.44
CA6 P23280 1/20 0.44
CA9 Q16790 1/20 0.44
FOLH1 Q04609 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL120251 0.84 NPC1 (0.64) NPC1POLBCYP2C9RAB9ARXRA
SCHEMBL23715021 0.83 NPC1 (0.55) NPC1POLBCYP2C9RAB9ARXRA
SCHEMBL27820126 0.81 NPC1 (0.50) NPC1POLBCYP2C9RAB9ARXRA
SCHEMBL19658037 0.81 POLB (0.50) NPC1POLBCYP2C9RAB9ARXRA
SCHEMBL29466781 0.80 RXRA (0.56) NPC1POLBCYP2C9RAB9ARXRA
SCHEMBL179538 0.80 RXRA (0.66) RXRARXRBACHESRD5A2NR4A1
SCHEMBL1041916 0.80 RXRA (0.56) NPC1POLBCYP2C9RAB9ARXRA
SCHEMBL19987946 0.78 RXRA (0.64) NPC1RAB9ARXRARXRBACHE
SCHEMBL29486118 0.78 RXRA (0.54) NPC1POLBCYP2C9RAB9ARXRA
SCHEMBL2637669 0.78 RXRA (0.54) NPC1POLBCYP2C9RAB9ARXRA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7498116-B2 Resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2009-03-03 US disclosed
US-7498116-B2 Resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2009-03-03 US disclosed
US-20080241750-A1 RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241750-A1 RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed