Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.36 |
| ▸ | HSD11B2 | P80365 | 1/20 | 0.36 |
| ▸ | PKM | P14618 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | DPP8 | Q6V1X1 | 1/20 | 0.32 |
| ▸ | DPP9 | Q86TI2 | 1/20 | 0.32 |
| ▸ | SCN9A | Q15858 | 3/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2734992 | 0.89 | HSD11B1 (0.37) | HSD11B1HSD11B2PKMLMNATHRB | |
| SCHEMBL13899589 | 0.78 | ALDH1A1 (0.47) | LMNA | |
| SCHEMBL10188085 | 0.77 | PKM (0.34) | PKMLMNATHRBDPP8DPP9 | |
| SCHEMBL13899608 | 0.74 | DPP8 (0.38) | DPP8DPP9 | |
| SCHEMBL12603699 | 0.74 | PKM (0.38) | HSD11B1PKMDPP8DPP9 | |
| SCHEMBL10225229 | 0.72 | ALDH1A1 (0.31) | — | |
| SCHEMBL2734993 | 0.71 | ALDH1A1 (0.47) | LMNA | |
| SCHEMBL2618626 | 0.70 | — | — | |
| SCHEMBL12932666 | 0.70 | NPSR1 (0.37) | PKMLMNADPP8DPP9 | |
| SCHEMBL14802401 | 0.70 | DPP8 (0.39) | DPP8DPP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7504194-B2 | Resin showing an increase in solubility in alkali developer by action of an acid, a compound being capable of generating an acid when irradiated with an actinic ray or radiation, an acrylic resin with silicon-containing units and being stable to acids but insoluble in alkali developer, solvent | FUJIFILM CORPORATION (JP) | 2009-03-17 | — | — | US | disclosed |
| US-20070134590-A1 | Resin showing an increase in solubility in alkali developer by action of an acid, a compound being capable of generating an acid when irradiated with an actinic ray or radiation, an acrylic resin with silicon-containing units and being stable to acids but insoluble in alkali developer, solvent | FUJIFILM CORPORATION. (JP) | 2007-06-14 | — | — | US | disclosed |