SCHEMBL13913083

SCHEMBL13913083

CCC(C)(C)C(=O)OC(C)OC1C2CC3CC(C2)C(=O)C1C3

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13008688 0.83 HMGCR (0.32)
SCHEMBL47428 0.83 HSD11B1 (0.32)
SCHEMBL13913084 0.81
SCHEMBL15745520 0.81
SCHEMBL15278120 0.81
SCHEMBL47427 0.80
SCHEMBL4276861 0.78
SCHEMBL12107850 0.75
SCHEMBL12854401 0.74
SCHEMBL13849044 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8927147-B2 Negative electrode base member KANTO GAKUIN SCHOOL CORPORATION (JP) 2015-01-06 US disclosed
US-20130252098-A1 NEGATIVE ELECTRODE BASE MEMBER KANTO GAKUIN UNIVERSITY SURFACE ENGINEERING RESEARCH INSTITUTE (JP) 2013-09-26 US disclosed
US-20090068342-A1 POSITIVE PHOTORESIST COMPOSITION, THICK FILM PHOTORESIST LAMINATE, METHOD FOR PRODUCING THICK FILM RESIST PATTERN, AND METHOD FOR PRODUCING CONNECTING TERMINAL TOKYO OHKA KOGYO CO., LTD. (JP) 2009-03-12 US disclosed