Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.50 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.39 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.39 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | PGR | P06401 | 1/20 | 0.39 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.39 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.39 |
| ▸ | HTR1A | P08908 | 1/20 | 0.39 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.39 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.39 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.39 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.39 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.39 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.39 |
| ▸ | CHRNA9 | Q9UGM1 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.38 |
| ▸ | GALR3 | O60755 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL55735 | 0.87 | ALDH1A1 (0.43) | ALDH1A1CHRM5CHRM1CHRM3TSHR | |
| SCHEMBL29234348 | 0.85 | ALDH1A1 (0.44) | ALDH1A1CHRM5CHRM1CHRM3TSHR | |
| Acetic Acid SCHEMBL29199856 | 0.83 | ALDH1A1 (0.40) | ALDH1A1CHRM5CHRM1CHRM3TSHR | |
| SCHEMBL29807574 | 0.82 | ALDH1A1 (0.39) | ALDH1A1CHRM5CHRM1CHRM3TSHR | |
| Ethylene Glycol SCHEMBL21693892 | 0.82 | ALDH1A1 (0.39) | ALDH1A1CHRM5CHRM1CHRM3TSHR | |
| SCHEMBL8767363 | 0.82 | ALDH1A1 (0.48) | ALDH1A1CHRM5CHRM1CHRM3TSHR | |
| SCHEMBL11316006 | 0.80 | ALDH1A1 (0.56) | ALDH1A1CHRM5CHRM1CHRM3TSHR | |
| SCHEMBL5790141 | 0.80 | ALDH1A1 (0.52) | ALDH1A1CHRM5CHRM1CHRM3TSHR | |
| SCHEMBL16230597 | 0.79 | POLB (0.33) | ALDH1A1GAALMNATDP1CYP3A4 | |
| Propene SCHEMBL29089347 | 0.79 | ALDH1A1 (0.36) | ALDH1A1CHRM5CHRM1CHRM3TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1020 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025106697-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | claimed |
| WO-2025106703-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | claimed |
| US-11822250-B2 | Solution, method of forming resist pattern, and semiconductor device manufacturing method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-21 | — | — | US | claimed |
| US-11488824-B2 | Method for manufacturing semiconductor device using silicon-containing resist underlayer film forming composition for solvent development | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2022-11-01 | — | — | US | claimed |
| CN-122095069-A | Washing liquid and washing method | — | 2026-05-26 | — | — | CN | disclosed |
| CN-122095070-A | Washing liquid and washing method | — | 2026-05-26 | — | — | CN | disclosed |
| EP-4743828-A1 | PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING | BASF SE (DE) | 2026-05-20 | — | — | EP | disclosed |
| EP-4745668-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND METHOD FOR PRODUCING LAMINATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-20 | — | — | EP | disclosed |
| CN-122070516-A | Negative photosensitive composition, photosensitive resist film, method for producing hollow structure, and method for forming pattern | 东京应化工业株式会社 | 2026-05-19 | — | — | CN | disclosed |
| US-12631962-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-19 | — | — | US | disclosed |
| US-12631963-B2 | Method for producing hollow package and method for providing photosensitive composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-19 | — | — | US | disclosed |
| WO-2026100268-A1 | NEGATIVE PHOTOSENSITIVE FILM, MULTILAYER FILM, DRY FILM, AND NEGATIVE PHOTOSENSITIVE COMPOSITION | 東京応化工業株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-6054545-A | CELLULOSE MODIFIED WITH CARBOXYLATED ISOCYANATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-04-25 | — | — | US | disclosed |
| US-5924912-A | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1999-07-20 | — | — | US | disclosed |
| US-5916738-A | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1999-06-29 | — | — | US | disclosed |
| EP-0894808-A1 | Modified cellulose compound and photopolymerizable resin composition containing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-02-03 | — | — | EP | disclosed |
| EP-0890417-A1 | Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrate using the same and method for treating sandblasting waste matters | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-01-13 | — | — | EP | disclosed |
| US-5756261-A | A CURABLE PHOTORESISTS BLENDS COMPRISING A POLYETHERURETHANE OR A POLYESTERURETHANE COPOLYMER WITH AN ACRYLIC COPOLYMER AND CARBOXY GROUP-CONTAINING CELLULOSE, A PHOTOINITIATOR; ADHESION, FLEXIBILITY, ELASTICITY | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1998-05-26 | — | — | US | disclosed |
| CN-1140843-A | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRIC CORP (JP) | 1997-01-22 | — | — | CN | disclosed |
| EP-0741332-A1 | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1996-11-06 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12631962-B2 | Resist composition and method for forming resist pattern | TERB1, TERF2, LSM8 | ALDH1A1 1639/4885CHRM5 4034/4885CHRM1 3745/4885 |
| US-12631963-B2 | Method for producing hollow package and method for providing photosensitive composition | ASH2L, AS3MT, ASH1L | ALDH1A1 2680/4885CHRM5 2532/4885CHRM1 713/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.