Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.43 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.41 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.41 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | PGR | P06401 | 1/20 | 0.41 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.41 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.41 |
| ▸ | HTR1A | P08908 | 1/20 | 0.41 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.41 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.41 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.41 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.41 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.41 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.41 |
| ▸ | CHRNA9 | Q9UGM1 | 1/20 | 0.41 |
| ▸ | GAA | P10253 | 2/20 | 0.40 |
| ▸ | GALR3 | O60755 | 2/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL29199856 | 0.96 | ALDH1A1 (0.40) | ALDH1A1CHRM5CHRM1CHRM3TSHR | |
| Ethylene Glycol SCHEMBL21693892 | 0.94 | ALDH1A1 (0.39) | ALDH1A1CHRM5CHRM1CHRM3TSHR | |
| Propene SCHEMBL29089347 | 0.90 | ALDH1A1 (0.36) | ALDH1A1CHRM5CHRM1CHRM3TSHR | |
| SCHEMBL29234348 | 0.89 | ALDH1A1 (0.44) | ALDH1A1CHRM5CHRM1CHRM3TSHR | |
| Propylene Glycol SCHEMBL5068933 | 0.87 | CHRM5 (0.37) | ALDH1A1CHRM5CHRM1CHRM3TSHR | |
| SCHEMBL28986792 | 0.87 | ALDH1A1 (0.38) | ALDH1A1CHRM5CHRM1CHRM3TSHR | |
| SCHEMBL139217 | 0.87 | ALDH1A1 (0.50) | ALDH1A1CHRM5CHRM1CHRM3TSHR | |
| SCHEMBL29807574 | 0.86 | ALDH1A1 (0.39) | ALDH1A1CHRM5CHRM1CHRM3TSHR | |
| SCHEMBL19112293 | 0.84 | ALOX15 (0.38) | ALDH1A1CHRM5CHRM1CHRM3TSHR | |
| SCHEMBL12330817 | 0.84 | ALDH1A1 (0.36) | ALDH1A1TSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 9093 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12635377-B2 | Display panel including color filter layer | WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD. (CN) | 2026-05-19 | — | — | US | claimed |
| EP-4709561-A2 | PANELS, METHOD FOR MANUFACTURING PANELS, MIXTURE AND LACQUER | Unilin, BV (BE) | 2026-03-18 | — | — | EP | claimed |
| WO-2025106697-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | claimed |
| WO-2025106703-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | claimed |
| CN-119639270-A | Special cleaning agent for printing ink, preparation method and use method thereof | 广东新球清洗科技股份有限公司 | 2025-03-18 | — | — | CN | claimed |
| CN-119596640-A | Positive photosensitive polyimide composition with high elongation at break and application thereof | 万华化学集团股份有限公司 | 2025-03-11 | — | — | CN | claimed |
| WO-2025032169-A1 | POSITIVE TONE PATTERNS FROM METAL ORGANIC RESISTS | MERCK PATENT GMBH (DE) | 2025-02-13 | — | — | WO | claimed |
| US-12214549-B2 | Three-dimensional printing | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) | 2025-02-04 | — | — | US | claimed |
| CN-119352026-A | Aluminum/molybdenum and molybdenum/aluminum/molybdenum etching solution and preparation method and application thereof | 绵阳艾萨斯电子材料有限公司 | 2025-01-24 | — | — | CN | claimed |
| CN-119105236-A | High-hydrophobicity photosensitive polyimide photoresist composition and application thereof | 万华化学集团股份有限公司 | 2024-12-10 | — | — | CN | claimed |
| EP-0629671-B1 | Solvent composition | MITSUBISHI RAYON CO (JP) | 2002-03-27 | — | — | EP | claimed |
| EP-1170343-A1 | INFRARED SENSITIVE COATING LIQUID | Asahi Kasei Kabushiki Kaisha (JP) | 2002-01-09 | — | — | EP | claimed |
| EP-1016699-A1 | Use of a solvent composition comprising an oxyisobutyric acid ester as a cleaning agent | Mitsubishi Rayon Co., Ltd. (JP) | 2000-07-05 | — | — | EP | claimed |
| EP-1016698-A1 | Use of a solvent composition containing an oxyisobutyric acid ester as a solvent in coatings, adhesives and printing inks | Mitsubishi Rayon Co., Ltd. (JP) | 2000-07-05 | — | — | EP | claimed |
| US-6010824-A | Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-01-04 | — | — | US | claimed |
| US-5834603-A | Polymerization initiator composition | NIPPOH CHEMICALS CO., LTD. (JP) | 1998-11-10 | — | — | US | claimed |
| US-5612303-A | HYDROXY OR ETHERIFIED ESTERS | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1997-03-18 | — | — | US | claimed |
| EP-0629671-A2 | Solvent composition | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1994-12-21 | — | — | EP | claimed |
| EP-0260994-B1 | PROCESS FOR PRODUCING INTEGRATED CIRCUIT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-07-15 | — | — | EP | claimed |
| EP-0260994-A2 | Process for producing integrated circuit | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1988-03-23 | — | — | EP | claimed |