Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | ENPP2 | Q13822 | 8/20 | 0.37 |
| ▸ | PRKCA | P17252 | 3/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | LPAR6 | P43657 | 3/20 | 0.36 |
| ▸ | LPAR1 | Q92633 | 3/20 | 0.36 |
| ▸ | LPAR4 | Q99677 | 3/20 | 0.36 |
| ▸ | LPAR5 | Q9H1C0 | 3/20 | 0.36 |
| ▸ | LPAR2 | Q9HBW0 | 3/20 | 0.36 |
| ▸ | LPAR3 | Q9UBY5 | 3/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15081600 | 0.89 | TDP1 (0.38) | ALDH1A1LMNAHSD17B10TDP1ENPP2 | |
| SCHEMBL25628009 | 0.88 | TDP1 (0.45) | ALDH1A1LMNAHSD17B10TDP1ENPP2 | |
| SCHEMBL30279850 | 0.86 | ENPP2 (0.33) | ALDH1A1LMNAHSD17B10TDP1ENPP2 | |
| SCHEMBL1470166 | 0.84 | ALDH1A1 (0.42) | ALDH1A1LMNAENPP2CA1CA2 | |
| SCHEMBL18124442 | 0.83 | PRKCA (0.40) | ALDH1A1LMNAHSD17B10TDP1TSHR | |
| SCHEMBL144017 | 0.83 | TDP1 (0.42) | ALDH1A1LMNAHSD17B10TDP1ENPP2 | |
| SCHEMBL28749210 | 0.82 | ALDH1A1 (0.53) | ALDH1A1LMNAHSD17B10TSHRPRKCA | |
| SCHEMBL425452 | 0.82 | TDP1 (0.50) | ALDH1A1LMNAHSD17B10TDP1TSHR | |
| SCHEMBL5192564 | 0.82 | TDP1 (0.50) | ALDH1A1LMNAHSD17B10TDP1TSHR | |
| SCHEMBL1470013 | 0.82 | CA1 (0.41) | ALDH1A1ENPP2CA1CA2LPAR6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1306 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025106697-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | claimed |
| WO-2025106703-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | claimed |
| US-11822250-B2 | Solution, method of forming resist pattern, and semiconductor device manufacturing method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-21 | — | — | US | claimed |
| US-11488824-B2 | Method for manufacturing semiconductor device using silicon-containing resist underlayer film forming composition for solvent development | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2022-11-01 | — | — | US | claimed |
| CN-114539524-A | Photosensitive resin precursor polymer, photosensitive resin composition paste and use thereof | 吉林奥来德光电材料股份有限公司 | 2022-05-27 | — | — | CN | claimed |
| CN-104914672-B | Bottom anti-reflection composition based on molecular glass containing polyhydroxy structure and application thereof | 中国科学院化学研究所 | 2020-08-21 | — | — | CN | claimed |
| CN-104914672-A | Bottom anti-reflection coating composition based on molecule glass comprising multiple hydroxy structures and application thereof to photoetching | CHINESE ACAD INST CHEMISTRY | 2015-09-16 | — | — | CN | claimed |
| US-20090181218-A1 | Conductive pattern and method of forming thereof | LG CHEM, LTD. (KR) | 2009-07-16 | — | — | US | claimed |
| US-5738975-A | MIXTURE CONTAINING (METH)ACRYLATE TERPOLYMER HAVING GROUP WHICH REACTS WITH AN ACID TO CONVERT POLARITY OF POLYMER, PHOTO ACID GENERATING COMPOUND, SOLVENT | NEC CORPORATION (JP) | 1998-04-14 | — | — | US | claimed |
| CN-122095069-A | Washing liquid and washing method | — | 2026-05-26 | — | — | CN | disclosed |
| CN-122095070-A | Washing liquid and washing method | — | 2026-05-26 | — | — | CN | disclosed |
| EP-4745668-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND METHOD FOR PRODUCING LAMINATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-20 | — | — | EP | disclosed |
| EP-4743828-A1 | PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING | BASF SE (DE) | 2026-05-20 | — | — | EP | disclosed |
| US-12631963-B2 | Method for producing hollow package and method for providing photosensitive composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-19 | — | — | US | disclosed |
| US-5585507-A | FINENESS PATTERNS | NEC CORPORATION (JP) | 1996-12-17 | — | — | US | disclosed |
| EP-0741332-A1 | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1996-11-06 | — | — | EP | disclosed |
| EP-0720053-A2 | Photosensitive resin composition, photosensitive printing plate and method of manufacturing printing master plate | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-07-03 | — | — | EP | disclosed |
| US-5242782-A | Flexographic printing plate | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1993-09-07 | — | — | US | disclosed |
| US-5128234-A | PRODUCTION OF PHOTOPOLYMERIC FLEXOGRAPHIC RELIEF PRINTING PLATES | BASF AKTIENGESELLSCHAFT (DE) | 1992-07-07 | — | — | US | disclosed |
| EP-0439123-A2 | A method for producing a photocured image structure | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1991-07-31 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12631963-B2 | Method for producing hollow package and method for providing photosensitive composition | ASH2L, AS3MT, ASH1L | ALDH1A1 2680/4885LMNA 3028/4885HSD17B10 4748/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.