Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.60 |
| ▸ | DGAT1 | O75907 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL7072256 | 1.00 | ALDH1A1 (0.60) | ALDH1A1DGAT1TSHR | |
| SCHEMBL1820007 | 0.94 | ALDH1A1 (0.68) | ALDH1A1DGAT1TSHR | |
| SCHEMBL1798280 | 0.94 | ALDH1A1 (0.68) | ALDH1A1DGAT1TSHR | |
| Methacrylic Acid SCHEMBL6011830 | 0.92 | ALDH1A1 (0.44) | ALDH1A1DGAT1TSHR | |
| Methacrylic Acid SCHEMBL4637357 | 0.92 | ALDH1A1 (0.44) | ALDH1A1DGAT1TSHR | |
| Methacrylic Acid SCHEMBL1730167 | 0.90 | ALDH1A1 (0.42) | ALDH1A1DGAT1TSHR | |
| SCHEMBL8398377 | 0.85 | ALDH1A1 (0.42) | ALDH1A1DGAT1TSHR | |
| Methacrylic Acid SCHEMBL1171642 | 0.85 | ALDH1A1 (0.83) | ALDH1A1TSHR | |
| SCHEMBL33412 | 0.85 | ALDH1A1 (0.50) | ALDH1A1DGAT1TSHR | |
| Methacrylic Acid SCHEMBL10493520 | 0.85 | ALDH1A1 (0.83) | ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107207456-B | Latent acids and their use | 巴斯夫欧洲公司 | 2021-05-04 | — | — | CN | disclosed |
| EP-3253735-B1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2021-03-31 | — | — | EP | disclosed |
| US-20210009723-A1 | Acid-Labile, Crosslinked Polymers, Compositions and Methods of Their Use | NAWROCKI DANIEL J (US) | 2021-01-14 | — | — | US | disclosed |
| EP-2539316-B1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2019-10-23 | — | — | EP | disclosed |
| US-9994538-B2 | Latent acids and their use | BASF SE (DE) | 2018-06-12 | — | — | US | disclosed |
| US-20180009775-A1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2018-01-11 | — | — | US | disclosed |
| EP-2990874-B1 | MAGNETIC CARRIER AND TWO-COMPONENT DEVELOPER | CANON KK (JP) | 2017-10-11 | — | — | EP | disclosed |
| CN-103353707-B | Coating composition for photoresist | 罗门哈斯电子材料有限公司 | 2016-06-29 | — | — | CN | disclosed |
| EP-1595182-B1 | HALOGENATED OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS | BASF SE (DE) | 2015-09-30 | — | — | EP | disclosed |
| EP-1769286-B1 | OXIME DERIVATIVES AND THE USE THEROF AS LATENT ACIDS | BASF SE (DE) | 2015-09-09 | — | — | EP | disclosed |
| EP-1004936-B1 | RESIST RESIN, RESIST RESIN COMPOSITION, AND PROCESS FOR PATTERNING THEREWITH | SHOWA DENKO KK (JP) | 2003-10-08 | — | — | EP | disclosed |
| WO-2003067332-A2 | SULFONATE DERIVATIVES AND THE USE THEROF AS LATENT ACIDS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2003-08-14 | — | — | WO | disclosed |
| EP-1320785-A2 | OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS | Ciba SC Holding AG (CH) | 2003-06-25 | — | — | EP | disclosed |
| US-6512020-B1 | Photosensitive acid-donors in chemically amplified resist formulations. activated by irradiation with actinic electromagnetic radiation and electron beams. | CIBA SPECIALTY CHEMICALS CORPORATION | 2003-01-28 | — | — | US | disclosed |
| WO-2002025376-A2 | OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2002-03-28 | — | — | WO | disclosed |
| US-20010036591-A1 | Iodonium salts as latent acid donors | IGM GROUP B.V. (NL) | 2001-11-01 | — | — | US | disclosed |
| US-6306555-B1 | RADIATION-SENSITIVE COMPOSITION COMPRISING CATIONICALLY OR ACID-CATALYTICALLY POLYMERISABLE OR CROSSLINKABLE COMPOUND OR COMPOUND THAT INCREASES ITS SOLUBILITY IN DEVELOPER UNDER ACTION OF ACID, AND AT LEAST ONE DIARYLIODONIUM SALT | CIBA SPECIALTY CHEMICALS CORP. | 2001-10-23 | — | — | US | disclosed |
| US-6303268-B1 | SENSITIVITY TO RADIATION | SHOWA DENKO K.K. (JP) | 2001-10-16 | — | — | US | disclosed |
| US-6261738-B1 | LATENT CURING CATALYSTS FOR PHOTORESISTS SUCH AS 2,2,2-TRIFLUORO-1-PHENYL-ETHANONE OXIME-O-METHYL SULFONATE | CIBA SPECIALTY CHEMICALS CORPORATION | 2001-07-17 | — | — | US | disclosed |
| EP-1004936-A1 | RESIST RESIN, RESIST RESIN COMPOSITION, AND PROCESS FOR PATTERNING THEREWITH | Showa Denko K K (JP) | 2000-05-31 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180009775-A1 | LATENT ACIDS AND THEIR USE | LTA, C1S, C9 | ALDH1A1 217/4885DGAT1 1221/4885TSHR 3529/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.