SCHEMBL1397184

SCHEMBL1397184

CCC(=O)OC=Cc1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 2/20 0.46
L3MBTL1 Q9Y468 2/20 0.46
GLA P06280 1/20 0.46
TDP1 Q9NUW8 1/20 0.46
PAM P19021 2/20 0.44
LMNA P02545 3/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
ALDH1A1 P00352 2/20 0.44
HDAC3 O15379 1/20 0.44
TNKS O95271 1/20 0.44
HDAC4 P56524 1/20 0.44
HDAC1 Q13547 1/20 0.44
HCAR2 Q8TDS4 1/20 0.44
HDAC7 Q8WUI4 1/20 0.44
HDAC2 Q92769 1/20 0.44
HDAC10 Q969S8 1/20 0.44
HDAC11 Q96DB2 1/20 0.44
HDAC8 Q9BY41 1/20 0.44
TNKS2 Q9H2K2 1/20 0.44
HDAC6 Q9UBN7 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11817417 1.00 NPC1 (0.46) NPC1L3MBTL1GLATDP1PAM
SCHEMBL9757616 0.98 NPC1 (0.45) NPC1L3MBTL1GLATDP1PAM
SCHEMBL14838523 0.90 HDAC2 (0.46) NPC1L3MBTL1SMN1; SMN2HDAC1HDAC2
SCHEMBL3239706 0.86 NPC1 (0.44) NPC1L3MBTL1GLATDP1PAM
SCHEMBL11819176 0.86 NPC1 (0.44) NPC1L3MBTL1GLATDP1PAM
SCHEMBL3866464 0.85 HAO1 (0.47) NPC1GLATDP1PAMLMNA
SCHEMBL3866469 0.85 HAO1 (0.47) NPC1GLATDP1PAMLMNA
SCHEMBL3870456 0.85 ALDH1A1 (0.47) NPC1L3MBTL1GLATDP1PAM
SCHEMBL3870459 0.85 ALDH1A1 (0.47) NPC1L3MBTL1GLATDP1PAM
SCHEMBL27717672 0.83 PAM (0.46) NPC1L3MBTL1GLATDP1PAM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 145 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118271496-A Isoalkenyl terpolymer containing oxygen polar groups and preparation method thereof 常州汉韦聚合物有限公司 2024-07-02 CN claimed
US-9034440-B2 Positive photosensitive resin composition and cured film forming method using the same FUJIFILM CORPORATION (JP) 2015-05-19 US claimed
US-4137137-A Radiation process for the production of graft copolymer to be used for ion-exchange membrane JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JP) 1979-01-30 US claimed
CN-118271496-A Isoalkenyl terpolymer containing oxygen polar groups and preparation method thereof 常州汉韦聚合物有限公司 2024-07-02 CN disclosed
CN-117425521-A Moisture controlling material and moisture controlling material with packaging material 夏普株式会社 2024-01-19 CN disclosed
CN-117263778-A Preparation method of styrene series compound for 248nm photoresist 河北凯诺中星科技有限公司 2023-12-22 CN disclosed
CN-109776465-B Synthesis method of benzodihydrofuran derivative with C2 quaternary carbon center 国网湖南省电力有限公司 2023-06-06 CN disclosed
CN-115803309-A Odorous compounds and methods of making the same 丝趣科尔卡有限公司 2023-03-14 CN disclosed
CN-107207456-B Latent acids and their use 巴斯夫欧洲公司 2021-05-04 CN disclosed
EP-3253735-B1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2021-03-31 EP disclosed
CN-109776388-B Synthetic method of indoline derivative with C2 quaternary carbon center 国网湖南省电力有限公司 2020-10-27 CN disclosed
WO-2002025376-A2 OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2002-03-28 WO disclosed
US-20010036591-A1 Iodonium salts as latent acid donors IGM GROUP B.V. (NL) 2001-11-01 US disclosed
US-6306555-B1 RADIATION-SENSITIVE COMPOSITION COMPRISING CATIONICALLY OR ACID-CATALYTICALLY POLYMERISABLE OR CROSSLINKABLE COMPOUND OR COMPOUND THAT INCREASES ITS SOLUBILITY IN DEVELOPER UNDER ACTION OF ACID, AND AT LEAST ONE DIARYLIODONIUM SALT CIBA SPECIALTY CHEMICALS CORP. 2001-10-23 US disclosed
US-6261738-B1 LATENT CURING CATALYSTS FOR PHOTORESISTS SUCH AS 2,2,2-TRIFLUORO-1-PHENYL-ETHANONE OXIME-O-METHYL SULFONATE CIBA SPECIALTY CHEMICALS CORPORATION 2001-07-17 US disclosed
CN-1269826-A Washing and detergent moulded bodides with improved solubility HENKEL KGAA (DE) 2000-10-11 CN disclosed
CN-1269825-A Washing and cleaning agent shaped bodies with solubility HENKEL KGAA (DE) 2000-10-11 CN disclosed
US-4137137-A Radiation process for the production of graft copolymer to be used for ion-exchange membrane JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JP) 1979-01-30 US disclosed
US-4129617-A Fluoro carbon graft copolymer and process for the production thereof JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JP) 1978-12-12 US disclosed
US-3936473-A COPPER OR NOBLE METAL SALT, OXYGEN AND ORGANIC ACID CATALYST UNIVERSAL OIL PRODUCTS COMPANY (US) 1976-02-03 US disclosed